Bromide

Bromide

SCHEMBL2361069

Br.C=Cc1ccccc1O

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4

The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TRIM24 O15164 1/20 0.54
TRIM33 Q9UPN9 1/20 0.54
TRPA1 O75762 1/20 0.48
ALDH1A1 P00352 3/20 0.48
CA2 P00918 8/20 0.46
CA12 O43570 7/20 0.46
CA9 Q16790 5/20 0.46
NFKB1 P19838 3/20 0.46
KDM4E B2RXH2 2/20 0.46
CDK4 P11802 1/20 0.46
CCND1 P24385 1/20 0.46
SIRT2 Q8IXJ6 1/20 0.46
JUN P05412 1/20 0.46
NFE2L2 Q16236 1/20 0.46
MAPT P10636 3/20 0.45
CA4 P22748 2/20 0.45
LMNA P02545 2/20 0.45
HPGD P15428 2/20 0.45
NPC1 O15118 1/20 0.45
GMNN O75496 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29511549 0.97
SCHEMBL20076 0.97
Fluoride SCHEMBL2197395 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
SCHEMBL27854641 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
SCHEMBL28147333 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
Benzene SCHEMBL23581564 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
Methane SCHEMBL2951846 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
SCHEMBL6122881 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
Water SCHEMBL27841262 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2
SCHEMBL27862002 0.95 TRIM24 (0.54) TRIM24TRIM33TRPA1ALDH1A1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 127 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024116572-A1 IMIDE GROUP-CONTAINING RESIN 東洋紡エムシー株式会社 2024-06-06 WO disclosed
WO-2024116571-A1 ADHESIVE COMPOSITION 東洋紡エムシー株式会社 2024-06-06 WO disclosed
WO-2024090394-A1 LAMINATED STRUCTURE, METHOD FOR PRODUCING SAME, CURED PRODUCT, AND ELECTRONIC COMPONENT 太陽ホールディングス株式会社 2024-05-02 WO disclosed
WO-2024090396-A1 CURABLE RESIN COMPOSITION, MULTILAYER STRUCTURE, CURED PRODUCT AND ELECTRONIC COMPONENT 太陽ホールディングス株式会社 2024-05-02 WO disclosed
WO-2023031986-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM, MULTILAYER PRINTED WIRING BOARD, SEMICONDUCTOR PACKAGE, AND METHOD FOR MANUFACTURING MULTILAYER PRINTED WIRING BOARD 昭和電工マテリアルズ株式会社 2023-03-09 WO disclosed
CN-112313302-B Adhesive composition comprising acrylonitrile butadiene rubber co-polyamideimide resin 东洋纺株式会社 2022-06-03 CN disclosed
CN-109843981-B Polycarbonate imide resin and resin composition containing the same 东洋纺株式会社 2022-05-31 CN disclosed
CN-106715590-B Polycarbonate imide resin paste and electronic component having solder resist layer, surface protective layer, interlayer insulating layer or adhesive layer obtained by curing the paste 东洋纺株式会社 2022-01-04 CN disclosed
WO-2021060285-A1 CURABLE RESIN COMPOSITION, DRY FILM, CURED PRODUCT, AND ELECTRONIC COMPONENT 太陽インキ製造株式会社 2021-04-01 WO disclosed
CN-112534019-A Adhesive composition using resin having imide bond and phosphorus compound 东洋纺株式会社 2021-03-19 CN disclosed
EP-0919873-B1 Photo curable resin composition and photosensitive element HITACHI CHEMICAL CO LTD (JP) 2004-01-21 EP disclosed
EP-0915383-B1 Photosensitive resin composition HITACHI CHEMICAL CO LTD (JP) 2004-01-21 EP disclosed
US-6583198-B2 A photocurable resin consists of an acid modified vinyl group containing epoxy resin, an elastomer, a photopolymerization initiator, a diluent and a curing agent, can give high performance cured film HITACHI CHEMICAL COMPANY, LTD. (JP) 2003-06-24 US disclosed
US-20030087189-A1 Flexibility, heat resistance, waterproofing, bonding strength; mixture of photosensitve resin, epoxy resin, photoinitiator SHOWA DENKO K.K. (JP) 2003-05-08 US disclosed
US-20020169226-A1 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film SATO KUNIAKI (JP) 2002-11-14 US disclosed
US-20010053437-A1 Photo-cured film, and photosensitive element, printed wiring board and semiconductor package using such film SATO KUNIAKI (JP) 2001-12-20 US disclosed
US-20010003759-A1 PHOTO CURABLE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-06-14 US disclosed
US-6238840-B1 CURABLE SOLDER RESIST COMPRISING A PHOTOSENSITIVE RESIN HAVING ONE OR MORE CARBOXYL GROUPS, A PHENOLIC DIGLYCIDYL ETHER EPOXY CURING AGENT, AND A PHOTOINITIATOR; ADHESION, HEAT RESISTANCE, RESOLUTION HITACHI CHEMICAL COMPANY, LTD. (JP) 2001-05-29 US disclosed
EP-0919873-A1 Photo curable resin composition and photosensitive element HITACHI CHEMICAL CO., LTD. (JP) 1999-06-02 EP disclosed
EP-0915383-A2 Photosensitive resin composition HITACHI CHEMICAL CO., LTD. (JP) 1999-05-12 EP disclosed