SCHEMBL2008540

SCHEMBL2008540

CCCCCC[N+](CCCCCC)(CCCCCC)c1ccccc1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 4/20 0.55
SMN1; SMN2 Q16637 3/20 0.53
MEN1 O00255 2/20 0.53
KMT2A Q03164 2/20 0.53
MAPK1 P28482 2/20 0.53
TP53 P04637 2/20 0.53
HTT P42858 4/20 0.52
MLNR O43193 1/20 0.49
NR1I2 O75469 1/20 0.49
ESR1 P03372 1/20 0.49
NR3C1 P04150 1/20 0.49
PGR P06401 1/20 0.49
ADRB2 P07550 1/20 0.49
CHRM2 P08172 1/20 0.49
ADRB1 P08588 1/20 0.49
HTR1A P08908 1/20 0.49
ADRA2A P08913 1/20 0.49
ADORA3 P0DMS8 1/20 0.49
CHRM1 P11229 1/20 0.49
DRD2 P14416 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2007788 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889253 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889256 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889247 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889304 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889261 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889310 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889264 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889255 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1
SCHEMBL15889244 1.00 DNM1 (0.55) DNM1SMN1; SMN2MEN1KMT2AMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7964541-B2 a mixture of hydrocarbon solvents, fatty acids, ammonium and/or phosphonium compounds, used as lapping oils for finishing recorders TOKUYAMA CORPORATION (JP) 2011-06-21 US disclosed
US-20080176779-A1 Lubricant Composition for Polishing a Magnetic Head with Fixed Abrasive Grains TOKUYAMA CORPORATION (JP) 2008-07-24 US disclosed