SCHEMBL20096397

SCHEMBL20096397

CCCC1(CCC)c2cc(N)ccc2-c2ccc(C(=O)/C(CC3CCCCC3)=N/OC(C)=O)cc21

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 2/20 0.36
▸ KMT2A Q03164 2/20 0.33
▸ ALDH1A1 P00352 2/20 0.33
▸ MEN1 O00255 1/20 0.32
▸ L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18123001 0.90 PDK2 (0.37) POLBKMT2AALDH1A1
SCHEMBL20006519 0.90 POLB (0.34) POLBKMT2AALDH1A1MEN1
SCHEMBL18122990 0.89 PDK2 (0.37) POLB
SCHEMBL18123008 0.86 ALDH1A1 (0.44) POLBKMT2AALDH1A1MEN1L3MBTL1
SCHEMBL22989401 0.86 MEN1 (0.38) POLBKMT2AALDH1A1MEN1L3MBTL1
SCHEMBL22355421 0.85 PDK2 (0.36) POLBKMT2AALDH1A1
SCHEMBL18123029 0.85 POLB (0.31) POLB
SCHEMBL18122994 0.85 FFAR1 (0.33) POLB
SCHEMBL18926236 0.84 PDK2 (0.38) —
SCHEMBL18123007 0.84 PDK2 (0.37) POLBKMT2AALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230028822-A1 PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-26 — — US disclosed
US-20220404709-A1 PHOTOSENSITIVE INK COMPOSITION, CURED PRODUCT, DISPLAY PANEL, AND METHOD FOR PRODUCING CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2022-12-22 — — US disclosed
US-11142629-B2 Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-12 — — US disclosed
US-20190300674-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2019-10-03 — — US disclosed
US-10416560-B2 Coloring agent dispersion, photosensitive resin composition, cured product, organic el element, method for forming pattern, and method for producing photosensitive resin composition TOKYO OHKA KOGYO CO, LTD. (JP) 2019-09-17 — — US disclosed
US-20180113383-A1 COLORING AGENT DISPERSION, PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, ORGANIC EL ELEMENT, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2018-04-26 — — US disclosed
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