SCHEMBL20104976

SCHEMBL20104976

CC(I)CC(c1ccc(OC(C)(C)C)cc1)C(C)C

nearest known ligand 0.38

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ACACB O00763 2/20 0.38
CNR1 P21554 9/20 0.36
CNR2 P34972 5/20 0.36
SLC6A2 P23975 1/20 0.35
SLC6A4 P31645 1/20 0.35
SLC6A3 Q01959 1/20 0.35
POLB P06746 1/20 0.33
PKM P14618 1/20 0.33
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
TAAR1 Q96RJ0 1/20 0.31
GAA P10253 1/20 0.31
MAPK1 P28482 1/20 0.31
NPSR1 Q6W5P4 1/20 0.31
PDE2A O00408 1/20 0.30
PLA2G1B P04054 1/20 0.30
ATG4B Q9Y4P1 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16181733 0.86 ACACB (0.39) ACACBCNR1CNR2SLC6A2SLC6A4
SCHEMBL20444086 0.81 CNR1 (0.33) CNR1CNR2SLC6A3TAAR1
SCHEMBL14228173 0.81 ACACB (0.40) ACACBCNR1CNR2SLC6A2SLC6A4
SCHEMBL18412091 0.76 ACACB (0.44) ACACBCNR1CNR2SLC6A2SLC6A4
SCHEMBL18574380 0.75 OPRD1 (0.34) SLC6A2SLC6A4SLC6A3TAAR1
SCHEMBL21709878 0.73 CYP2C9 (0.40) SLC6A2SLC6A4SLC6A3
SCHEMBL18403100 0.73 ESR1 (0.52) SLC6A2SLC6A3TAAR1
SCHEMBL15521572 0.72 ACACB (0.44) ACACBCNR1CNR2SLC6A2SLC6A4
SCHEMBL18611040 0.72 TAAR1 (0.57) SLC6A2SLC6A4SLC6A3PKMTAAR1
SCHEMBL19954387 0.72 CNR1 (0.35) CNR1CNR2POLBPKMMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230229078-A1 CHEMICAL LIQUID SUPPLY METHOD AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2023-07-20 US disclosed
US-10788754-B2 Pattern forming method and electronic device manufacturing method FUJIFILM CORPORATION (JP) 2020-09-29 US disclosed
US-20200301281-A1 RESIST COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-09-24 US disclosed
US-20180120705-A1 PATTERN FORMING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed