SCHEMBL20109820

SCHEMBL20109820

CC/C(=C/C(C)=O)C(=O)O

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.38
TDP1 Q9NUW8 2/20 0.38
FFAR3 O14843 2/20 0.38
TSHR P16473 2/20 0.37
KDM4E B2RXH2 1/20 0.37
GRIK1 P39086 3/20 0.33
GRIK2 Q13002 3/20 0.33
ABAT P80404 1/20 0.30
LCK P06239 1/20 0.30
FYN P06241 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1977289 1.00 ALDH1A1 (0.38) ALDH1A1TDP1FFAR3TSHRKDM4E
Acetic Acid SCHEMBL25265937 0.82 KDM4E (0.52) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL106220 0.81 TSHR (0.56) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL14464086 0.81 ALDH1A1 (0.40) ALDH1A1TDP1FFAR3TSHR
SCHEMBL106219 0.81 TSHR (0.56) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL141679 0.81 TSHR (0.56) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL9352101 0.80 FFAR3 (0.35) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL4375015 0.80 ALDH1A1 (0.35) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL22649363 0.80 FFAR3 (0.35) ALDH1A1TDP1FFAR3TSHRKDM4E
SCHEMBL4375017 0.80 ALDH1A1 (0.35) ALDH1A1TDP1FFAR3TSHRKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4658737-A1 PROCESSES FOR PRODUCING REACTION PRODUCTS INCLUDING QUATERNARY AMMONIUM SALTS The Lubrizol Corporation (US) 2025-12-10 EP disclosed
WO-2024163826-A1 PROCESSES FOR PRODUCING REACTION PRODUCTS INCLUDING QUATERNARY AMMONIUM SALTS THE LUBRIZOL CORPORATION (US) 2024-08-08 WO disclosed
US-20180118887-A1 PRECURSOR COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PRECURSOR COMPOSITION, CURED FILM, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2018-05-03 US disclosed