Ether

Ether

SCHEMBL2012348

C=C(C)C(=O)OCCOCCO.CCOCC

nearest known ligand 0.76

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.76
TSHR P16473 9/20 0.49
ALDH1A1 P00352 7/20 0.47
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
HTT P42858 2/20 0.37
MAPT P10636 1/20 0.37
MAPK1 P28482 1/20 0.36
POLB P06746 1/20 0.35
APEX1 P27695 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TP53 P04637 2/20 0.34
HIF1A Q16665 2/20 0.34
HSD17B10 Q99714 1/20 0.34
EPHX2 P34913 1/20 0.32
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ether SCHEMBL2009035 1.00 THRB (0.76) THRBTSHRALDH1A1MEN1KMT2A
Tetraethylene Glycol SCHEMBL5685767 0.93 THRB (0.65) THRBTSHRALDH1A1MEN1KMT2A
Triethylene Glycol SCHEMBL1922503 0.93 THRB (0.65) THRBTSHRALDH1A1MEN1KMT2A
SCHEMBL61385 0.93 THRB (0.68) THRBTSHRALDH1A1MEN1KMT2A
SCHEMBL2367411 0.93 THRB (0.68) THRBTSHRALDH1A1MEN1KMT2A
Tetraethylene Glycol SCHEMBL8659912 0.93 THRB (0.68) THRBTSHRALDH1A1MEN1KMT2A
SCHEMBL33376 0.93 THRB (0.68) THRBTSHRALDH1A1MEN1KMT2A
Ether SCHEMBL22660834 0.93 THRB (0.88) THRBTSHRALDH1A1HTTPOLB
SCHEMBL863839 0.93 THRB (0.68) THRBTSHRALDH1A1MEN1KMT2A
Di(Hydroxyethyl)Ether SCHEMBL18317889 0.93 THRB (0.68) THRBTSHRALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020151637-A1 Polymeric structural support membrane CONSTRUCTION RESEARCH & TECHNOLOGY GMBH (DE) 2002-10-17 US claimed
WO-2025036743-A1 THERMO-CURABLE GEL COAT RESIN COMPOSITION ALLNEX BELGIUM, S.A. (BE) 2025-02-20 WO disclosed
EP-4509541-A1 THERMO-CURABLE RESIN COMPOSITION Allnex Belgium, S.A. (BE) 2025-02-19 EP disclosed
CN-112840016-A Cell culture substrate, method for producing cell culture substrate, and method for producing spheroid 东曹株式会社 2021-05-25 CN disclosed
US-20140210140-A1 NANOIMPRINTING METHOD AND RESIST COMPOSITION EMPLOYED IN THE NANOIMPRINTING METHOD FUJIFILM CORPORATION (JP) 2014-07-31 US disclosed
US-20130026674-A1 NANOIMPRINTING METHOD AND METHOD FOR PRODUCING A MOLD FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-8318824-B2 Hydrophilic polyolefin sintered body ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-11-27 US disclosed
US-20120095121-A1 HYDROPHILIC POLYOLEFIN SINTERED BODY ASAHI KASEI CHEMICALS CORPORATION (JP) 2012-04-19 US disclosed
US-20110183243-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR AND ELECTROPHOTOGRAPHIC IMAGING APPARATUS INCLUDING THE PHOTORECEPTOR SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-07-28 US disclosed
US-7964683-B2 Biocompatible polymeric compound, biocompatible polymer and polymer particles FUJIFILM CORPORATION (JP) 2011-06-21 US disclosed
US-6863973-B2 Fiber-reinforced plastic molded article, its production method and a molding mold using that method DAINIPPON INK AND CHEMICALS, INC. (JP) 2005-03-08 US disclosed
EP-1496077-A1 NOVEL POLYETHER COMPOUND CONTAINING ACID GROUP AND UNSATURATED GROUP, PROCESS FOR PRODUCING THE SAME, AND RESIN COMPOSITION DAICEL CHEMICAL INDUSTRIES, Ltd. (JP) 2005-01-12 EP disclosed
EP-1323004-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES MacDermid, Incorporated (US) 2003-07-02 EP disclosed
US-20030035961-A1 Fiber-reinforced plastic molded article, its production method and a molding mold using that method DAINIPPON INK AND CHEMICALS, INC. (JP) 2003-02-20 US disclosed
EP-1249333-A2 Fiber-reinforced plastic molded article and method for its production DAINIPPON INK AND CHEMICALS, INC. (JP) 2002-10-16 EP disclosed
US-6372387-B1 Secondary battery having an ion conductive member and manufacturing process thereof CANON KABUSHIKI KAISHA (JP) 2002-04-16 US disclosed
WO-2002019035-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR FLEXOGRAPHIC PRINTING PLATES MACDERMID, INCORPORATED (US) 2002-03-07 WO disclosed
EP-1020766-A1 Photosensitive resin composition for flexographic printing plates MACDERMID INCORPORATED (US) 2000-07-19 EP disclosed
EP-0948074-A2 Secondary battery and manufacturing process therefor CANON KABUSHIKI KAISHA (JP) 1999-10-06 EP disclosed
US-4192685-A POLY(METH)ACRYLATE COMPOUND, UNSATURATED AMIDE, UNSATURATED ESTER AS CROSSLINKERS TEIJIN LIMITED (JP) 1980-03-11 US disclosed