SCHEMBL20162231

SCHEMBL20162231

C[N+](C)(CC1CO1)CC1CO1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 16/20 0.52
CHRM5 P08912 12/20 0.52
CHRM1 P11229 9/20 0.52
TSHR P16473 1/20 0.52
MAPK1 P28482 1/20 0.52
CHRM3 P20309 12/20 0.50
CHRM4 P08173 10/20 0.50
KDM4E B2RXH2 1/20 0.50
HTT P42858 1/20 0.50
ALDH1A1 P00352 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
PRKD3 O94806 2/20 0.37
PRKCG P05129 2/20 0.37
PRKCB P05771 2/20 0.37
PRKCA P17252 2/20 0.37
PRKCH P24723 2/20 0.37
PRKCI P41743 2/20 0.37
PRKCE Q02156 2/20 0.37
PRKCQ Q04759 2/20 0.37
PRKCZ Q05513 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL1415293 0.97 CHRM2 (0.50) CHRM2CHRM5CHRM1TSHRMAPK1
Iodide SCHEMBL11797425 0.97 CHRM2 (0.54) CHRM2CHRM5CHRM1TSHRMAPK1
SCHEMBL19164287 0.88 CHRM2 (0.48) CHRM2CHRM5CHRM1TSHRMAPK1
SCHEMBL587971 0.86
SCHEMBL19164807 0.84 PRKD3 (0.47) CHRM2CHRM5CHRM1TSHRMAPK1
SCHEMBL10625841 0.84
Hydrochloric Acid SCHEMBL194196 0.84 CHRM2 (0.45) CHRM2CHRM5CHRM1TSHRMAPK1
Hydrochloric Acid SCHEMBL10903569 0.82 PRKD3 (0.46) CHRM2CHRM5CHRM1TSHRMAPK1
SCHEMBL19164286 0.82 PRKD3 (0.50) CHRM2CHRM5CHRM1TSHRMAPK1
SCHEMBL27815607 0.82 PRKD3 (0.46) CHRM2CHRM5CHRM1TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11174555-B2 Chromium-free plating-on-plastic etch MACDERMID ENTHONE GMBH (DE) 2021-11-16 US claimed
US-20200063264-A1 Chromium-Free Plating-on-Plastic Etch MACDERMID ENTHONE GMBH (DE) 2020-02-27 US claimed
EP-3323910-B1 CHROMIUM-FREE PLATING-ON-PLASTIC ETCH MACDERMID ENTHONE GMBH (DE) 2018-11-14 EP claimed
EP-3323910-A1 CHROMIUM-FREE PLATING-ON-PLASTIC ETCH MacDermid Enthone GmbH (DE) 2018-05-23 EP claimed
EP-4638615-A1 RESIN CONTAINING PRE-TREATMENT LIQUID FOR INKJET PRINTING AND RECORDING METHOD AGFA NV (BE) 2025-10-29 EP disclosed
US-20240392150-A1 Resin Particle Dispersion for Inkjet Printing AGFA NV (BE) 2024-11-28 US disclosed
EP-4441155-A1 RESIN PARTICLE DISPERSION FOR INKJET PRINTING AGFA NV (BE) 2024-10-09 EP disclosed
WO-2024132405-A1 RESIN CONTAINING PRE-TREATMENT LIQUID FOR INKJET PRINTING AND RECORDING METHOD AGFA NV (BE) 2024-06-27 WO disclosed
WO-2023099254-A1 RESIN PARTICLE DISPERSION FOR INKJET PRINTING AGFA NV (BE) 2023-06-08 WO disclosed
US-11174555-B2 Chromium-free plating-on-plastic etch MACDERMID ENTHONE GMBH (DE) 2021-11-16 US disclosed
US-20200063264-A1 Chromium-Free Plating-on-Plastic Etch MACDERMID ENTHONE GMBH (DE) 2020-02-27 US disclosed
EP-3323910-B1 CHROMIUM-FREE PLATING-ON-PLASTIC ETCH MACDERMID ENTHONE GMBH (DE) 2018-11-14 EP disclosed
EP-3323910-A1 CHROMIUM-FREE PLATING-ON-PLASTIC ETCH MacDermid Enthone GmbH (DE) 2018-05-23 EP disclosed