SCHEMBL20170366

SCHEMBL20170366

COC(=O)N(CC(C)C)C(C)(C)C

nearest known ligand 0.37

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
MMP8 P22894 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20924899 0.80 CA12 (0.32) CA12CA1CA2CA9
SCHEMBL5209106 0.76 CA1 (0.38) CA12CA1CA2CA9
SCHEMBL305960 0.76 TSHR (0.31)
SCHEMBL684382 0.76 TSHR (0.31)
SCHEMBL7940725 0.74 KDM4E (0.38) CA12CA1CA2CA9
SCHEMBL5209096 0.74 CA1 (0.37) CA12CA1CA2CA9
SCHEMBL12937451 0.73
SCHEMBL306031 0.73 CA12 (0.50) CA12CA1CA2CA9
SCHEMBL13234106 0.72 CA12 (0.37) CA12CA1CA2CA9
SCHEMBL393708 0.72 TDP1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1621927-B1 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same FUJIFILM CORP (JP) 2018-05-23 EP disclosed