⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17752164 | 0.97 | — | — | |
| Iodide SCHEMBL30196691 | 0.97 | — | — | |
| Bromide SCHEMBL9219320 | 0.97 | — | — | |
| Iodide SCHEMBL25250391 | 0.84 | KDM4E (0.35) | — | |
| N-Methyl Pyrrolidine (Nmp) SCHEMBL25247182 | 0.81 | KDM4E (0.33) | — | |
| Bromide SCHEMBL31402695 | 0.73 | KDM4E (0.44) | — | |
| Hydrochloric Acid SCHEMBL7289221 | 0.73 | BBOX1 (0.45) | — | |
| SCHEMBL9936384 | 0.72 | KDM4E (0.55) | — | |
| SCHEMBL6744983 | 0.72 | KDM4E (0.42) | — | |
| Hydrochloric Acid SCHEMBL31672182 | 0.71 | KDM4E (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11774853-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-10-03 | — | — | US | disclosed |
| US-11733608-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-22 | — | — | US | disclosed |
| US-11720018-B2 | Chemically amplified resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-08-08 | — | — | US | disclosed |
| US-20230216086-A1 | ELECTROLYTES FOR TARGET ION TRANSPORT | MONASH UNIVERSITY (AU) | 2023-07-06 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20230152692-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-18 | — | — | US | disclosed |
| US-20210294211-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-09-23 | — | — | US | disclosed |
| US-20210033969-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |
| US-20180143532-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-05-24 | — | — | US | disclosed |