⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7148462 | 1.00 | — | — | |
| SCHEMBL6119704 | 0.78 | — | — | |
| SCHEMBL294964 | 0.72 | — | — | |
| Fluoride SCHEMBL27653582 | 0.69 | — | — | |
| SCHEMBL210276 | 0.67 | — | — | |
| SCHEMBL9070710 | 0.67 | — | — | |
| SCHEMBL167103 | 0.67 | — | — | |
| SCHEMBL5998620 | 0.67 | — | — | |
| SCHEMBL11644593 | 0.67 | — | — | |
| SCHEMBL7148459 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9235120-B2 | Negative actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, resist-coated mask blanks, resist pattern forming method, and photomask | FUJIFILM CORPORATION (JP) | 2016-01-12 | — | — | US | disclosed |
| EP-2570853-B1 | Oxygen-blocking film and lithographic printing plate precursor comprising said film | FUJIFILM CORP (JP) | 2014-08-20 | — | — | EP | disclosed |
| US-20140178806-A1 | NEGATIVE ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, RESIST-COATED MASK BLANKS, RESIST PATTERN FORMING METHOD, AND PHOTOMASK | FUJIFILM CORPORATION (JP) | 2014-06-26 | — | — | US | disclosed |
| US-20130071786-A1 | COATING COMPOSITION AND IMAGE-FORMING MATERIAL, LITHOGRAPHIC PRINTING PLATE PRECURSOR AND OXYGEN-BLOCKING FILM INCLUDING THE COATING COMPOSITION | FUJIFILM CORPORATION (JP) | 2013-03-21 | — | — | US | disclosed |
| EP-2570853-A2 | Coating composition and image-forming material, lithographic printing plate precursor and oxygen-blocking film including the coating composition | Fujifilm Corporation (JP) | 2013-03-20 | — | — | EP | disclosed |
| EP-2339400-A2 | Lithographic printing plate precursor and plate making method thereof | Fujifilm Corporation (JP) | 2011-06-29 | — | — | EP | disclosed |
| US-4028234-A | HYDROXY-SUBSTITUTED AMINES, ION EXCHANGE RESINS | AEROJET-GENERAL CORPORATION (US) | 1977-06-07 | — | — | US | disclosed |