SCHEMBL294964

SCHEMBL294964

COC=C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL27653582 0.96
Methoxymethane SCHEMBL11084951 0.80
SCHEMBL4624457 0.80
SCHEMBL2811099 0.78
SCHEMBL9718300 0.78
Water SCHEMBL11085514 0.75
Fluoride SCHEMBL27823400 0.75
SCHEMBL10582941 0.74 TSHR (0.36)
SCHEMBL2018537 0.72
SCHEMBL7148462 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 193 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108238875-A A kind of synthetic method of brominated isobutylene base methyl ether and its application in the preparation of C14 aldehyde 上虞新和成生物化工有限公司 2018-07-03 CN claimed
EP-2305402-B1 METHOD FOR PRODUCING SILVER-CONTAINING POWDER AND CONDUCTIVE PASTE USING THE SAME DAINIPPON INK & CHEMICALS (JP) 2017-11-29 EP claimed
CN-105384725-A Preparation method and application of azimsulfuron key intermediate JIANGXI ANLIDA CHEMICAL CO LTD 2016-03-09 CN claimed
US-4701336-A MIXTURE OF DIETHYL SUCCINATE, PHENETHYL FORMATE AND PHENETHYL ALCOHOL NABISCO BRANDS, INC. (US) 1987-10-20 US claimed
US-12164231-B2 Chemically amplified positive resist composition and resist pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-12-10 US disclosed
US-20240337927-A1 ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-10-10 US disclosed
CN-118724863-A Onium salt, chemically amplified positive resist composition, and resist pattern forming method 信越化学工业株式会社 2024-10-01 CN disclosed
CN-114924464-B Chemically amplified positive resist composition and method for forming resist pattern 信越化学工业株式会社 2024-09-24 CN disclosed
US-20240280900-A1 ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-08-22 US disclosed
EP-4407375-A1 ONIUM SALT, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-31 EP disclosed
CN-118388443-A Onium salt, chemically amplified positive resist composition, and resist pattern forming method 信越化学工业株式会社 2024-07-26 CN disclosed
US-20240094635-A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-03-21 US disclosed
EP-0467841-A2 Benzoic acid ester comprising an olefinically unsaturated substituant CIBA-GEIGY AG (CH) 1992-01-22 EP disclosed
US-4701336-A MIXTURE OF DIETHYL SUCCINATE, PHENETHYL FORMATE AND PHENETHYL ALCOHOL NABISCO BRANDS, INC. (US) 1987-10-20 US disclosed
EP-0060381-B1 PROCESS FOR THE PREPARATION OF 3,3-DIMETHYL-2-ALKOXYOXIRANES BY OXIDATION OF 1-ALKOXY-2-METHYL PROPENE HÜLS AKTIENGESELLSCHAFT (DE) 1985-05-15 EP disclosed
EP-0079432-B1 PROCESS FOR THE PRODUCTION OF METHACRYLIC ACID FROM ISOBUTYRALDEHYDE HÜLS AKTIENGESELLSCHAFT (DE) 1984-10-24 EP disclosed
US-4469887-A MULTISTAGE CHEMISCHE WERKE HUELS, AG (DE) 1984-09-04 US disclosed
US-4403098-A OXIDATION CHEMISCHE WERKE HULS AKTIENGESELLSCHAFT (DE) 1983-09-06 US disclosed
EP-0079432-A1 Process for the production of methacrylic acid from isobutyraldehyde HÜLS AKTIENGESELLSCHAFT (DE) 1983-05-25 EP disclosed
US-3935200-A HERBICIDE BASF AKTIENGESELLSCHAFT (DT) 1976-01-27 US disclosed