SCHEMBL20203375

SCHEMBL20203375

CCCCCN(C)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27474409 0.97 DNM1 (0.60)
SCHEMBL27297974 0.97 DNM1 (0.60)
SCHEMBL29012275 0.97 DNM1 (0.60)
SCHEMBL29363073 0.97 DNM1 (0.60)
SCHEMBL5536819 0.97 DNM1 (0.60)
SCHEMBL2583607 0.90
Hydrochloric Acid SCHEMBL2587299 0.88
SCHEMBL5404334 0.83 TSHR (0.50)
SCHEMBL9835669 0.78
Ethane SCHEMBL11663353 0.75 DNM1 (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119039175-A 1, 2-Diamine derivative and preparation method thereof 云南大学 2024-11-29 CN claimed
CN-119039175-A 1, 2-Diamine derivative and preparation method thereof 云南大学 2024-11-29 CN disclosed
CN-119039175-A 1, 2-Diamine derivative and preparation method thereof 云南大学 2024-11-29 CN disclosed
US-10558119-B2 Composition for coating resist pattern NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-02-11 US disclosed
EP-3091603-B1 ELECTROLYTIC SOLUTION AND ELECTROCHEMICAL DEVICE DAIKIN IND LTD (JP) 2020-01-29 EP disclosed
US-20180149977-A1 COMPOSITION FOR COATING RESIST PATTERN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-05-31 US disclosed