Methacrylic Acid

Methacrylic Acid

SCHEMBL202040

C=C(C)C(=O)O.CN(C)CCC(Cl)c1ccccc1

nearest known ligand 0.50

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 2/20 0.50
HRH1 P35367 2/20 0.50
HPGD P15428 1/20 0.42
UTS2R Q9UKP6 6/20 0.42
ALDH1A1 P00352 1/20 0.42
CYP3A4 P08684 1/20 0.42
TSHR P16473 1/20 0.42
CYP2C19 P33261 1/20 0.42
KDM4E B2RXH2 1/20 0.42
LMNA P02545 1/20 0.42
RAB9A P51151 1/20 0.42
UBE2N P61088 1/20 0.40
CHRM2 P08172 1/20 0.40
SLC6A2 P23975 1/20 0.40
SLC6A4 P31645 1/20 0.40
SCN1A P35498 1/20 0.40
SCN2A Q99250 1/20 0.40
SCN3A Q9NY46 1/20 0.40
MBTD1 Q05BQ5 1/20 0.40
L3MBTL3 Q96JM7 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL6898657 0.85 LMNA (0.47) HPGDALDH1A1CYP3A4TSHRKDM4E
SCHEMBL4301966 0.85 HTR2A (0.67) HTR2AHRH1TSHRKDM4ELMNA
SCHEMBL7326678 0.85 HTR2A (0.67) HTR2AHRH1TSHRKDM4ELMNA
Acrylic Acid SCHEMBL28956302 0.85 HTR2A (0.50) HTR2AHRH1UTS2RALDH1A1CYP3A4
Hydrochloric Acid SCHEMBL4374402 0.84 HTR2A (0.64) HTR2AHRH1TSHRKDM4ELMNA
SCHEMBL20213768 0.81 HTR2A (0.43) HTR2AHRH1HPGDALDH1A1KDM4E
Methacrylic Acid SCHEMBL28193960 0.76 HPGD (0.44) HPGDALDH1A1TSHRKDM4ELMNA
Methacrylic Acid SCHEMBL28298450 0.74 UTS2R (0.41) HTR2AHRH1UTS2RALDH1A1KDM4E
SCHEMBL5580230 0.74 UTS2R (0.51) HTR2AHRH1UTS2RSLC6A4
Methacrylic Acid SCHEMBL1989727 0.73 HPGD (0.48) HTR2AHRH1HPGDLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024181332-A1 TONER SET 日本ゼオン株式会社 2024-09-06 WO disclosed
WO-2024181129-A1 TONER SET AND MAGENTA TONER 日本ゼオン株式会社 2024-09-06 WO disclosed
CN-117916664-A Photosensitive composition, cured product, and organic EL display device 东丽株式会社 2024-04-19 CN disclosed
WO-2023054118-A1 PHOTOSENSITIVE COMPOSITION, CURED OBJECT, AND ORGANIC-EL DISPLAY DEVICE 東レ株式会社 2023-04-06 WO disclosed
CN-108780288-B Positively chargeable black toner 日本瑞翁株式会社 2022-03-01 CN disclosed
US-20200166859-A1 TONER FOR DEVELOPING ELECTROSTATIC IMAGES ZEON CORPORATION (JP) 2020-05-28 US disclosed
US-8263303-B2 Method for producing colored resin particle dispersion liquid, colored resin particle dispersion liquid, and electrophotographic liquid developer FUJI XEROX CO., LTD. (JP) 2012-09-11 US disclosed
US-8088486-B2 Microencapsulated particulate metal material, method for producing the same, and aqueous dispersion and ink jet ink using the same SEIKO EPSON CORPORATION (JP) 2012-01-03 US disclosed
CN-101951882-A Powder treated with (meth)acrylic-grafted silicone polymer and product using the same 3M INNOVATIVE PROPERTIES CO 2011-01-19 CN disclosed
US-7812070-B2 Microencapsulated pigment, preparation process therefor, aqueous dispersion and ink jet recording ink SEIKO EPSON CORPORATION (JP) 2010-10-12 US disclosed
US-20060222851-A1 Encapsulated matter and production process thereof SEIKO EPSON CORPORATION 2006-10-05 US disclosed
US-20060135647-A1 Aqueous ink, ink tank, ink jet recording apparatus, ink jet recording method, and ink jet recorded image CANON KABUSHIKI KAISHA (JP) 2006-06-22 US disclosed
US-6936657-B2 Dispersion composition and method for producing the same HITACHI MAXELL, LTD. (JP) 2005-08-30 US disclosed
US-20050176877-A1 organic or inorganic pigment particles coated with anionic polymers; inks having dispersion and ejection stability, capable of obtaining images having excellent print density, colorfastness and wear resistance SEIKO EPSON CORPORATION 2005-08-11 US disclosed
US-6900253-B2 Ink for ink jet printer HITACHI MAXELL, LTD. (JP) 2005-05-31 US disclosed
US-6864302-B2 Ink jet recording method and ink set therefor SEIKO EPSON CORPORATION (JP) 2005-03-08 US disclosed
US-20030212198-A1 Dispersion composition and method for producing the same HITACHI MAXELL, LTD. 2003-11-13 US disclosed
US-6627696-B1 Polysiloxane graft copolymer in solvent; storage stability HITACHI MAXELL, LTD. (JP) 2003-09-30 US disclosed
US-20020077383-A1 Ink for ink jet printer HITACHI MAXELL, LTD. (JP) 2002-06-20 US disclosed
US-20020077385-A1 Ink jet recording method and ink set therefor SEIKO EPSON CORPORATION 2002-06-20 US disclosed