SCHEMBL2021137

SCHEMBL2021137

C=C(C)C(=O)C(C)Oc1ccc(C(C)(C)c2ccc(OC(C)C(=O)C(=C)C)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS1R3 Q7RTX0 1/20 0.42
TAS1R1 Q7RTX1 1/20 0.42
TAS1R2 Q8TE23 1/20 0.42
GAA P10253 2/20 0.39
CYP1A2 P05177 1/20 0.39
CYP2C9 P11712 1/20 0.39
PKM P14618 1/20 0.39
CYP2C19 P33261 1/20 0.39
KDM4E B2RXH2 3/20 0.37
ALDH1A1 P00352 2/20 0.37
TDP1 Q9NUW8 2/20 0.37
AR P10275 2/20 0.36
NR1H4 Q96RI1 1/20 0.36
KMT2A Q03164 2/20 0.36
MEN1 O00255 1/20 0.36
HTT P42858 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
POLB P06746 2/20 0.36
HPGD P15428 2/20 0.35
ESR1 P03372 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2706032 0.84 KDM4E (0.36) TAS1R3TAS1R1TAS1R2GAAKDM4E
SCHEMBL7110472 0.81 KDM4E (0.37) GAAKDM4EALDH1A1TDP1AR
SCHEMBL59814 0.79 AR (0.39) GAAKDM4EALDH1A1TDP1AR
SCHEMBL5181952 0.79 POLB (0.47) TAS1R3TAS1R1TAS1R2GAACYP1A2
SCHEMBL19458708 0.78 KDM4E (0.50) GAACYP1A2CYP2C9PKMCYP2C19
Propane SCHEMBL9476269 0.76 AR (0.39) GAAKDM4EALDH1A1TDP1AR
SCHEMBL6904850 0.76 AR (0.36) GAAKDM4EALDH1A1TDP1AR
SCHEMBL5922597 0.76 AR (0.36) GAAKDM4EALDH1A1TDP1AR
SCHEMBL20433023 0.76 AR (0.34) KDM4EALDH1A1TDP1ARHTT
SCHEMBL10941555 0.75 MAPT (0.43) TAS1R3TAS1R1TAS1R2GAACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250154361-A1 RECESS FILLING MATERIAL KIT, CURED PRODUCT THEREOF, AND RECESS FILLING METHOD RESONAC CORPORATION (JP) 2025-05-15 US disclosed
WO-2025047419-A1 TRANSFER FILM, METHOD FOR MANUFACTURING LAMINATE, AND METHOD FOR MANUFACTURING CIRCUIT WIRING BOARD 富士フイルム株式会社 2025-03-06 WO disclosed
WO-2024090516-A1 RADICAL POLYMERIZABLE RESIN CURING AGENT COMPOSITION AND RADICAL POLYMERIZABLE RESIN COMPOSITION 株式会社レゾナック 2024-05-02 WO disclosed
EP-4328206-A1 RECESS FILLING MATERIAL KIT, CURED PRODUCT OF SAME, AND RECESS FILLING METHOD Resonac Corporation (JP) 2024-02-28 EP disclosed
WO-2023210777-A1 TRANSFER FILM, METHOD FOR PRODUCING LAMINATE, METHOD FOR PRODUCING CIRCUIT WIRING SUBSTRATE, CIRCUIT WIRING SUBSTRATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2023-11-02 WO disclosed
WO-2022224989-A1 RECESS FILLING MATERIAL KIT, CURED PRODUCT THEREOF, AND METHOD FOR FILLING RECESS 昭和電工株式会社 2022-10-27 WO disclosed
WO-2022224988-A1 RECESS FILLING MATERIAL KIT, CURED PRODUCT OF SAME, AND RECESS FILLING METHOD 昭和電工株式会社 2022-10-27 WO disclosed
EP-3533809-B1 RADICAL-POLYMERIZABLE RESIN COMPOSITION SHOWA DENKO KK (JP) 2021-09-29 EP disclosed
EP-3533809-A1 RADICAL-POLYMERIZABLE RESIN COMPOSITION Showa Denko K.K. (JP) 2019-09-04 EP disclosed
EP-3228637-B1 RADICAL-POLYMERIZABLE RESIN COMPOSITION, CURING METHOD THEREOF, METHOD OF PRODUCING SAME, USE OF RADICAL-POLYMERIZABLE RESIN COMPOSITION, AND USE METHOD OF THEREOF SHOWA DENKO KK (JP) 2019-02-20 EP disclosed
US-9969836-B2 Radical-polymerizable resin composition, curing method thereof, method of producing same, use of radical-polymerizable resin composition, and use method of thereof SHOWA DENKO K.K. (JP) 2018-05-15 US disclosed
US-20180009926-A1 RADICAL-POLYMERIZABLE RESIN COMPOSITION, CURING METHOD THEREOF, METHOD OF PRODUCING SAME, USE OF RADICAL-POLYMERIZABLE RESIN COMPOSITION, AND USE METHOD OF THEREOF SHOWA DENKO K.K. (JP) 2018-01-11 US disclosed
EP-3228637-A1 RADICAL-POLYMERIZABLE RESIN COMPOSITION, CURING METHOD THEREOF, METHOD OF PRODUCING SAME, USE OF RADICAL-POLYMERIZABLE RESIN COMPOSITION, AND USE METHOD OF THEREOF Showa Denko K.K. (JP) 2017-10-11 EP disclosed
US-8592130-B2 Photosensitive resin composition, photosensitive element, method of forming resist pattern and method of producing printed wiring board HITACHI CHEMICAL COMPANY, LTD. (JP) 2013-11-26 US disclosed
US-20110159430-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT, METHOD OF FORMING RESIST PATTERN AND METHOD OF PRODUCING PRINTED WIRING BOARD HITACHI CHEMICAL COMPANY, LTD. (JP) 2011-06-30 US disclosed
EP-1346717-B1 One-bottle dental bonding composition DENTSPLY SANKIN K K (JP) 2007-05-23 EP disclosed
US-20040054028-A1 Light-curable dental adhesive composition HATTORI NOBUYUKI (JP) 2004-03-18 US disclosed
EP-1346717-A1 One-bottle dental bonding composition DENTSPLY-SANKIN K.K. (JP) 2003-09-24 EP disclosed