SCHEMBL7110472

SCHEMBL7110472

C=C(C)C(=O)C(C=O)Oc1ccc(C(C)(C)c2ccc(OC(C=O)C(=O)C(=C)C)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 10/20 0.37
ALDH1A1 P00352 7/20 0.37
SMN1; SMN2 Q16637 3/20 0.37
GAA P10253 2/20 0.36
AR P10275 3/20 0.35
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
POLB P06746 2/20 0.33
LMNA P02545 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
HTT P42858 3/20 0.33
HIF1A Q16665 1/20 0.33
MAPT P10636 1/20 0.33
ESR1 P03372 1/20 0.32
CYP3A4 P08684 1/20 0.32
HPGD P15428 1/20 0.32
TSHR P16473 1/20 0.32
SLC6A2 P23975 1/20 0.32
SLC6A4 P31645 1/20 0.32
HTR6 P50406 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2021137 0.81 TAS1R3 (0.42) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL2706032 0.79 KDM4E (0.36) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL10713787 0.77 AR (0.45) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL59814 0.74 AR (0.39) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL20433023 0.73 AR (0.34) KDM4EALDH1A1ARPOLBTDP1
SCHEMBL10760678 0.72 HTT (0.50) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL6904850 0.71 AR (0.36) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL17022747 0.71 HTT (0.37) KDM4EALDH1A1SMN1; SMN2GAAAR
Propane SCHEMBL9476269 0.71 AR (0.39) KDM4EALDH1A1SMN1; SMN2GAAAR
SCHEMBL5922597 0.71 AR (0.36) KDM4EALDH1A1SMN1; SMN2GAAAR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030232193-A1 Dry film resist and printed circuit board producing method FUJI PHOTO FILM CO., LTD. (JP) 2003-12-18 US disclosed
US-6528005-B2 Lenses; polysulfide or epoxy resins MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2003-03-04 US disclosed
US-20010041784-A1 Process for producing a lens by polymerizing bis(beta-epithiopropyl) ether MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2001-11-15 US disclosed