⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9745465 | 0.79 | — | — | |
| SCHEMBL14814048 | 0.74 | — | — | |
| SCHEMBL9671198 | 0.74 | — | — | |
| SCHEMBL9671052 | 0.74 | — | — | |
| SCHEMBL15754909 | 0.72 | — | — | |
| SCHEMBL15755226 | 0.72 | FAAH (0.30) | — | |
| SCHEMBL3906374 | 0.72 | — | — | |
| SCHEMBL907804 | 0.70 | — | — | |
| SCHEMBL1110008 | 0.69 | — | — | |
| SCHEMBL6013345 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9580444-B2 | Polycyclic pyrazolinone derivative and herbicide comprising same as effective component thereof | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2017-02-28 | — | — | US | disclosed |
| US-20160024110-A1 | POLYCYCLIC PYRAZOLINONE DERIVATIVE AND HERBICIDE COMPRISING SAME AS EFFECTIVE COMPONENT THEREOF | KAKEN PHARMACEUTICAL CO., LTD. (JP) | 2016-01-28 | — | — | US | disclosed |
| EP-2975040-A1 | POLYCYCLIC PYRAZOLINONE DERIVATIVE AND HERBICIDE COMPRISING SAME AS EFFECTIVE COMPONENT THEREOF | Sagami Chemical Research Institute (JP) | 2016-01-20 | — | — | EP | disclosed |
| US-8367849-B2 | Production method for sultone derivatives | KURARAY CO., LTD. (JP) | 2013-02-05 | — | — | US | disclosed |
| US-20110160465-A1 | PRODUCTION METHOD FOR SULTONE DERIVATIVES | KURARAY CO., LTD (JP) | 2011-06-30 | — | — | US | disclosed |
| US-5100762-A | Radiation-sensitive polymer and radiation-sensitive composition containing the same | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1992-03-31 | — | — | US | disclosed |
| US-4265633-A | Process for the manufacture of vat dyes | CIBA-GEIGY AG (CH) | 1981-05-05 | — | — | US | disclosed |
| US-4243809-A | 5-SULFONYL-6-HYDROXYPYRIDONES OR THE 3-CARBAMOYL DERIVATIVES; SULFONYLATION WITH AN ALKYL SULFONYL HALIDE | CIBA-GEIGY CORPORATION (US) | 1981-01-06 | — | — | US | disclosed |