Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.51 |
| ▸ | MEN1 | O00255 | 3/20 | 0.51 |
| ▸ | CACNA1C | Q13936 | 6/20 | 0.51 |
| ▸ | CACNA1F | O60840 | 4/20 | 0.51 |
| ▸ | CACNA1D | Q01668 | 4/20 | 0.51 |
| ▸ | CACNA1S | Q13698 | 4/20 | 0.51 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.51 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | CYP2C9 | P11712 | 3/20 | 0.51 |
| ▸ | CYP2C19 | P33261 | 3/20 | 0.51 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.51 |
| ▸ | LMNA | P02545 | 2/20 | 0.51 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.51 |
| ▸ | TSHR | P16473 | 2/20 | 0.51 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.51 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.51 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29395113 | 1.00 | KMT2A (0.51) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL9400597 | 0.89 | KMT2A (0.51) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL30533378 | 0.86 | ADORA3 (0.71) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL3029836 | 0.86 | ADORA3 (0.71) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL202183 | 0.82 | CACNA1C (0.73) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL29358809 | 0.82 | CACNA1C (0.73) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL29004553 | 0.78 | CACNA1C (0.57) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL3037209 | 0.77 | KMT2A (0.50) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL9138577 | 0.77 | CACNA1C (0.67) | KMT2AMEN1CACNA1CCACNA1FCACNA1D | |
| SCHEMBL8440987 | 0.76 | MEN1 (0.57) | KMT2AMEN1HIF1AALDH1A1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0578177-B1 | Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern | NITTO DENKO CORP (JP) | 1997-03-05 | — | — | EP | claimed |
| EP-0578177-A2 | Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern | NITTO DENKO CORPORATION (JP) | 1994-01-12 | — | — | EP | claimed |
| US-12479960-B2 | Triazine ring-containing polymer and film forming composition containing same | NISSAN CHEMICAL CORPORATION (JP) | 2025-11-25 | — | — | US | disclosed |
| WO-2025013746-A1 | PATTERN-FORMING COMPOSITION | 日産化学株式会社 | 2025-01-16 | — | — | WO | disclosed |
| CN-117597398-A | Composition for pattern formation | 日产化学株式会社 | 2024-02-23 | — | — | CN | disclosed |
| CN-117321141-A | Solvent-free composition | 日产化学株式会社 | 2023-12-29 | — | — | CN | disclosed |
| CN-117279999-A | Composition for forming film | 日产化学株式会社 | 2023-12-22 | — | — | CN | disclosed |
| CN-117279979-A | Triazine ring-containing polymer and film-forming composition containing same | 日产化学株式会社 | 2023-12-22 | — | — | CN | disclosed |
| CN-117279980-A | Triazine ring-containing polymer and composition for pattern formation | 日产化学株式会社 | 2023-12-22 | — | — | CN | disclosed |
| CN-117279998-A | Solvent-free composition | 日产化学株式会社 | 2023-12-22 | — | — | CN | disclosed |
| CN-117255822-A | Triazine ring-containing polymer and composition for pattern formation | 日产化学株式会社 | 2023-12-19 | — | — | CN | disclosed |
| US-7320854-B2 | Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent | JSR CORPORATION (JP) | 2008-01-22 | — | — | US | disclosed |
| US-20060229384-A1 | Polymer precursor, high transparency polyimide precursor, polymer compound, resin composition and article using thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2006-10-12 | — | — | US | disclosed |
| EP-1494072-A2 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR Corporation (JP) | 2005-01-05 | — | — | EP | disclosed |
| US-20040265737-A1 | Radiation sensitive refractive index changing composition, pattern forming method and optical material | JSR CORPORATION (JP) | 2004-12-30 | — | — | US | disclosed |
| US-6333139-B1 | PROVIDING POLYIMIDE PRECURSOR SOLUTION COMPRISING A POLYIMIDE PRECURSOR AND PHOTOSENSITIVE AGENT ON A LONG STAINLESS STEEL FOIL; FURTHER PROVIDING CONDUCTOR LAYER FORMED BY LAMINATING COPPER LAYER VIA CHROMIUM LAYER OR TITANIUM LAYER OR DIRECTLY | NITTO DENKO CORPORATION (JP) | 2001-12-25 | — | — | US | disclosed |
| US-6117616-A | Circuit-forming substrate and circuit substrate | NITTO DENKO CORPORATION (JP) | 2000-09-12 | — | — | US | disclosed |
| US-5851736-A | Heat-resistant photoresist composition, photosensitive substrate, and process for forming heat-resistant positive or negative pattern | NITTO DENKO CORPORATION (JP) | 1998-12-22 | — | — | US | disclosed |
| EP-0578177-B1 | Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern | NITTO DENKO CORP (JP) | 1997-03-05 | — | — | EP | disclosed |
| EP-0578177-A2 | Heat-resistant negative photoresist composition, photosensitive substrate, and process for forming negative pattern | NITTO DENKO CORPORATION (JP) | 1994-01-12 | — | — | EP | disclosed |