⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid Ethyl Ester SCHEMBL5831496 | 0.95 | TSHR (0.56) | — | |
| Acrylic Acid Ethyl Ester SCHEMBL8159679 | 0.95 | TSHR (0.60) | — | |
| Acrylic Acid Ethyl Ester SCHEMBL3180 | 0.95 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL9557413 | 0.95 | TSHR (0.60) | — | |
| Acrylic Acid Ethyl Ester SCHEMBL4377433 | 0.93 | TSHR (0.54) | — | |
| Acrylic Acid Ethyl Ester SCHEMBL31612430 | 0.93 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL23607549 | 0.92 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL2482159 | 0.92 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL15553985 | 0.92 | TSHR (0.58) | — | |
| Acrylic Acid Ethyl Ester SCHEMBL2243109 | 0.92 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 199 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | claimed |
| US-8202946-B2 | Method of making graft copolymers from sodium poly(aspartate) and the resulting graft copolymer | NANOCHEM SOLUTIONS, INC. (US) | 2012-06-19 | — | — | US | claimed |
| US-20110213099-A1 | Method of making graft copolymers from sodium poly(aspartate) and the resulting graft copolymer | PATIL DAMODAR R | 2011-09-01 | — | — | US | claimed |
| US-7999040-B2 | Method of making graft copolymers from sodium poly(aspartate) and the resulting graft copolymer | NANOCHEM SOLUTIONS, INC. (US) | 2011-08-16 | — | — | US | claimed |
| US-7981964-B2 | Thermosetting paint compositions | BASF COATINGS JAPAN LTD. (JP) | 2011-07-19 | — | — | US | claimed |
| US-7767011-B2 | Aqueous gel ink compositions and method of printing same | XEROX CORPORATION (US) | 2010-08-03 | — | — | US | claimed |
| US-20090326165-A1 | METHOD OF MAKING GRAFT COPOLYMERS FROM SODIUM POLY(ASPARTATE) AND THE RESULTING GRAFT COPOLYMER | NANOCHEM SOLUTIONS, INC. | 2009-12-31 | — | — | US | claimed |
| US-20060266259-A1 | Aqueous gel ink compositions and method of printing same | XEROX CORPORATION (US) | 2006-11-30 | — | — | US | claimed |
| US-6765713-B2 | STABLE DISPERSION OF SILICONE OIL SOLUBLE POLYMER AND ORGANIC SULFONIC ACID COMPONENT | RICOH COMPANY, LTD. (JP) | 2004-07-20 | — | — | US | claimed |
| EP-0964052-B1 | Use of nitrogen-containing ethylene copolymers for producing fuel oils with improved lubricating activity | CLARIANT GMBH (DE) | 2004-02-04 | — | — | EP | claimed |
| US-20030230487-A1 | Electrophoretic composition, image display medium using same and image display device | TRANSCEND OPTRONICS (YANGZHOU) CO., LTD. (CN) | 2003-12-18 | — | — | US | claimed |
| US-4617367-A | COPOLYMERIZATION | MITSUI TOATSU CHEMICALS, INC. (JP) | 1986-10-14 | — | — | US | claimed |
| US-4543403-A | .MOISTURE CURABLE SILANE ENDCAPPED ACRYLIC POLYMER, TELECHELIC | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1985-09-24 | — | — | US | claimed |
| US-4299911-A | POLYMER CONTAINING AN ETHYLENICALLY UNSATURATED DOUBLE BOND | SOMAR MANUFACTURING CO., LTD. (JP) | 1981-11-10 | — | — | US | claimed |
| US-4259231-A | ACRYLIC ISOCYANATE CURABLE WITH MOISTURE | NITTO ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1981-03-31 | — | — | US | claimed |
| JP-54091547-A | — | — | None | — | — | JP | disclosed |
| JP-55054372-A | — | — | None | — | — | JP | disclosed |
| US-4076921-A | CROSSLINKING | CESKOSLOVENSKA AKADEMIE VED (CS) | 1978-02-28 | — | — | US | disclosed |
| US-4061844-A | AMINOALKYL ACRYLATE COPOLYMER, SILICON OR TIN COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-12-06 | — | — | US | disclosed |
| US-3977983-A | Liquid developer for use in development of an electrostatic latent image comprising a copolymer containing an amino group converted into a quaternary ammonium salt or hydroxide | CANON KABUSHIKI KAISHA (JA) | 1976-08-31 | — | — | US | disclosed |