Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 8/20 | 0.54 |
| ▸ | HPGD | P15428 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | TP53 | P04637 | 3/20 | 0.48 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | HCAR2 | Q8TDS4 | 1/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | MGAM | O43451 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | SI | P14410 | 1/20 | 0.39 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.39 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid Ethyl Ester SCHEMBL28234481 | 0.93 | TSHR (0.57) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL5576400 | 0.93 | TSHR (0.52) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL202495 | 0.93 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL5831496 | 0.93 | TSHR (0.56) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL3180 | 0.93 | — | — | |
| Acrylic Acid Ethyl Ester SCHEMBL9557413 | 0.93 | TSHR (0.60) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL8159679 | 0.93 | TSHR (0.60) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL2548085 | 0.91 | TSHR (0.50) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL3280684 | 0.91 | TSHR (0.55) | TSHRHPGDALDH1A1TP53HIF1A | |
| Acrylic Acid Ethyl Ester SCHEMBL31612430 | 0.91 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | claimed |
| US-6765713-B2 | STABLE DISPERSION OF SILICONE OIL SOLUBLE POLYMER AND ORGANIC SULFONIC ACID COMPONENT | RICOH COMPANY, LTD. (JP) | 2004-07-20 | — | — | US | claimed |
| US-20030230487-A1 | Electrophoretic composition, image display medium using same and image display device | TRANSCEND OPTRONICS (YANGZHOU) CO., LTD. (CN) | 2003-12-18 | — | — | US | claimed |
| US-3977983-A | Liquid developer for use in development of an electrostatic latent image comprising a copolymer containing an amino group converted into a quaternary ammonium salt or hydroxide | CANON KABUSHIKI KAISHA (JA) | 1976-08-31 | — | — | US | claimed |
| CN-122060716-A | Preparation method of nano enzyme material, composite composition and application thereof | 厦门瑞聚医学科技有限公司 | 2026-05-19 | — | — | CN | disclosed |
| CN-122005907-A | Enzyme polymer composite composition and application thereof | 厦门瑞聚医学科技有限公司 | 2026-05-12 | — | — | CN | disclosed |
| CN-120019125-A | Adhesive film, optical member including the same, and optical display device including the same | 三星SDI株式会社 | 2025-05-16 | — | — | CN | disclosed |
| US-8524111-B2 | CMP abrasive slurry for polishing insulation film, polishing method, and semiconductor electronic part polished by the polishing method | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2013-09-03 | — | — | US | disclosed |
| US-20090047786-A1 | CMP Abrasive Slurry for Polishing Insulation Film, Polishing Method, and Semiconductor Electronic Part Polished by the Polishing Method | RESONAC CORPORATION (JP) | 2009-02-19 | — | — | US | disclosed |
| US-7138214-B2 | Positively chargeable toner | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2006-11-21 | — | — | US | disclosed |
| US-20050064312-A1 | Positively chargeable toner | KONICA MINOLTA BUSINESS TECHNOLOGIES, INC. (JP) | 2005-03-24 | — | — | US | disclosed |
| US-6765713-B2 | STABLE DISPERSION OF SILICONE OIL SOLUBLE POLYMER AND ORGANIC SULFONIC ACID COMPONENT | RICOH COMPANY, LTD. (JP) | 2004-07-20 | — | — | US | disclosed |
| EP-0340975-A1 | Ethylene copolymers as sorbers of metallic ions from solutions | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-11-08 | — | — | EP | disclosed |
| EP-0091039-B1 | ANTI-FOULING AGENT | Nitto Kasei Co., Ltd. (JP) | 1986-10-01 | — | — | EP | disclosed |
| US-4526932-A | Copolymer containing N-coordinated triorganotin compound | NITTO KASEI CO., LTD. (JP) | 1985-07-02 | — | — | US | disclosed |
| EP-0091039-A2 | Anti-fouling agent | Nitto Kasei Co., Ltd. (JP) | 1983-10-12 | — | — | EP | disclosed |
| US-4271230-A | HEAT AND AGING RESISTANCE | SUMITOMO NAUGATUCK CO., LTD. (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4061844-A | AMINOALKYL ACRYLATE COPOLYMER, SILICON OR TIN COMPOUND | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-12-06 | — | — | US | disclosed |
| US-3977983-A | Liquid developer for use in development of an electrostatic latent image comprising a copolymer containing an amino group converted into a quaternary ammonium salt or hydroxide | CANON KABUSHIKI KAISHA (JA) | 1976-08-31 | — | — | US | disclosed |
| US-3969238-A | Liquid developer for electrophotography and process for developing latent images | CANON KABUSHIKI KAISHA (JA) | 1976-07-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030230487-A1 | Electrophoretic composition, image display medium using same and image display device | NEFM, ERGIC1, VCL | TSHR 3885/4885HPGD 2613/4885ALDH1A1 1448/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.