Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA4 | P22748 | 2/20 | 0.43 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 8/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.37 |
| ▸ | FFAR3 | O14843 | 2/20 | 0.36 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.36 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.36 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.36 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.36 |
| ▸ | CA1 | P00915 | 3/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30295805 | 0.95 | CA4 (0.43) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL1304416 | 0.95 | CA4 (0.48) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL543233 | 0.95 | CA4 (0.43) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL5547098 | 0.95 | CA4 (0.43) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL25368820 | 0.91 | CA4 (0.39) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL1720335 | 0.89 | CA4 (0.38) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL28554389 | 0.89 | CA4 (0.38) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL28339815 | 0.87 | CA4 (0.36) | CA4TSHRUSP2CA2CYP3A4 | |
| Acetoacetic Acid SCHEMBL939347 | 0.87 | CA4 (0.36) | CA4TSHRUSP2CA2CYP3A4 | |
| SCHEMBL23087972 | 0.85 | CA2 (0.37) | CA4TSHRUSP2CA2CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9902649-B2 | Method for producing surface-treated glass fiber film and flexible fiber substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2018-02-27 | — | — | US | disclosed |
| US-20150315073-A1 | METHOD FOR PRODUCING SURFACE-TREATED GLASS FIBER FILM AND FLEXIBLE FIBER SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-11-05 | — | — | US | disclosed |
| US-20150197885-A1 | SURFACE-MODIFIED GLASS FIBER FILM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-07-16 | — | — | US | disclosed |
| US-8999589-B2 | Nonaqueous secondary battery | SANYO ELECTRIC CO., LTD. (JP) | 2015-04-07 | — | — | US | disclosed |
| US-8951363-B2 | Anti-corrosive treatment for surfaces made of zinc and zinc alloys | ATOTECH DEUTSCHLAND GMBH (DE) | 2015-02-10 | — | — | US | disclosed |
| US-8709665-B2 | Nonaqueous secondary battery with nitrile group-containing compound | SANYO ELECTRIC CO., LTD. (JP) | 2014-04-29 | — | — | US | disclosed |
| US-20120091398-A1 | ANTI-CORROSIVE TREATMENT FOR SURFACES MADE OF ZINC AND ZINC ALLOYS | ATOTECH USA, LLC | 2012-04-19 | — | — | US | disclosed |
| US-20110183217-A1 | NONAQUEOUS SECONDARY BATTERY | SANYO ELECTRIC CO., LTD. (JP) | 2011-07-28 | — | — | US | disclosed |
| US-20110159359-A1 | NONAQUEOUS SECONDARY BATTERY | SANYO ELECTRIC CO., LTD. (JP) | 2011-06-30 | — | — | US | disclosed |
| US-7208256-B2 | Toner for image formation, method of producing the toner, toner container, toner cartridge, process cartridge, and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2007-04-24 | — | — | US | disclosed |
| EP-1117102-B1 | Method of manufacturing material for forming insulating film | JSR CORP (JP) | 2005-08-10 | — | — | EP | disclosed |
| US-20050026066-A1 | Toner for image formation, method of producing the toner, toner container, toner cartridge, process cartridge, and image forming apparatus | RICOH COMPANY, LTD. (JP) | 2005-02-03 | — | — | US | disclosed |
| US-6642352-B2 | Providing a silicon inorganic polymer compound or polyarylenes or polyphenylene ether organic polymer compound, treating the polymeric compound with a zeta-potential producing filter material, and producing curable polymer compound | JSR CORPORATION (JP) | 2003-11-04 | — | — | US | disclosed |
| US-20010009936-A1 | Method of manufacturing material for forming insulating film | JSR CORPORATION (JP) | 2001-07-26 | — | — | US | disclosed |
| EP-1117102-A2 | Method of manufacturing material for forming insulating film | JSR Corporation (JP) | 2001-07-18 | — | — | EP | disclosed |