⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5450560 | 0.94 | — | — | |
| Fluoride SCHEMBL29145918 | 0.94 | — | — | |
| SCHEMBL5450564 | 0.94 | — | — | |
| SCHEMBL29877111 | 0.89 | — | — | |
| SCHEMBL10709618 | 0.78 | — | — | |
| SCHEMBL28573819 | 0.78 | — | — | |
| Sulfuric Acid SCHEMBL3699224 | 0.72 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL8532128 | 0.72 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL2555505 | 0.72 | CA5A (1.00) | — | |
| Sulfuric Acid SCHEMBL418399 | 0.72 | CA5A (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 355 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119114138-A | Sulfonation modified mesoporous molecular sieve catalyst with high specific surface area, preparation method thereof and application thereof in cyclohexyl acetate synthesis reaction | 中国石油化工股份有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-119114102-A | Modified ultra-macroporous silica gel catalyst, preparation method thereof and application thereof in methyl oleate synthesis reaction | 中国石油化工股份有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-118206753-A | Photosensitive polyimide polymer, photosensitive polyimide resin composition, application of photosensitive polyimide resin composition and preparation method of pattern cured film | 徐州博康信息化学品有限公司 | 2024-06-18 | — | — | CN | claimed |
| CN-115636428-A | Preparation method of lithium fluorosulfonate | 山东永浩新材料科技有限公司 | 2023-01-24 | — | — | CN | claimed |
| EP-3997516-A1 | STABILIZED INTERFACES OF INORGANIC RADIATION PATTERNING COMPOSITIONS ON SUBSTRATES | Inpria Corporation (US) | 2022-05-18 | — | — | EP | claimed |
| EP-3959334-A1 | HYBRIDIZATION COMPOSITIONS AND METHODS FOR MAKING AND USING COMPOSITIONS | Agilent Technologies, Inc. (US) | 2022-03-02 | — | — | EP | claimed |
| WO-2021011367-A1 | STABILIZED INTERFACES OF INORGANIC RADIATION PATTERNING COMPOSITIONS ON SUBSTRATES | INPRIA CORPORATION (US) | 2021-01-21 | — | — | WO | claimed |
| US-20210011383-A1 | STABILIZED INTERFACES OF INORGANIC RADIATION PATTERNING COMPOSITIONS ON SUBSTRATES | INPRIA CORPORATION | 2021-01-14 | — | — | US | claimed |
| CN-110436944-A | A kind of photocurable composition | JF POLYMERS SUZHOU CO LTD | 2019-11-12 | — | — | CN | claimed |
| CN-110167979-A | A kind of photocurable compositions of 3D printing | 苏州聚复高分子材料有限公司 | 2019-08-23 | — | — | CN | claimed |
| US-6177228-B1 | COMPRISING A RADIATION-SENSITIVE ACID GENERATOR AND A POLYMER COMPRISING THE REACTION PRODUCT OF A MONOMER SELECTED FROM METHACRYLATE OR ACRYLATE HAVING A PHOTOACID CLEAVABLE ESTER SUBSTITUENT AND AN UNSATURATED ESTER MONOMER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-01-23 | — | — | US | claimed |
| US-6165673-A | Resist composition with radiation sensitive acid generator | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-12-26 | — | — | US | claimed |
| US-6090522-A | Chemical amplification photoresist comprising a reverse reaction inhibitor | NEC CORPORATION (JP) | 2000-07-18 | — | — | US | claimed |
| EP-0677788-B1 | Radiation-sensitive mixture | CLARIANT FINANCE BVI LTD (VG) | 2000-06-21 | — | — | EP | claimed |
| US-5962184-A | Photoresist composition comprising a copolymer of a hydroxystyrene and a (meth)acrylate substituted with an alicyclic ester substituent | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1999-10-05 | — | — | US | claimed |
| US-5663035-A | PHOTOSENSITIVE ACID GENERATORS, PHOTORESISTS, CONTROLLING ACID DIFFUSION WITH IODONIUM COMPOUND | HOECHST JAPAN LIMITED (JP) | 1997-09-02 | — | — | US | claimed |
| EP-0778495-A1 | Resist composition with radiation sensitive acid generator | International Business Machines Corporation (US) | 1997-06-11 | — | — | EP | claimed |
| EP-0677788-A1 | Radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1995-10-18 | — | — | EP | claimed |
| US-5286901-A | Prescursors for and synthesis of mono- and difunctionalized acetylenes and difunctional 1,3-diynes | UNIVERSITY OF UTAH RESEARCH FOUNDATION (US) | 1994-02-15 | — | — | US | claimed |
| US-4780511-A | Method for making polymeric photoactive aryl iodonium salts, products obtained therefrom, and use | GENERAL ELECTRIC COMPANY (US) | 1988-10-25 | — | — | US | claimed |