SCHEMBL203778

SCHEMBL203778

C=C(C)C(=O)Oc1cccc(S(N)(=O)=O)c1

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CA2 P00918 12/20 0.47
CA1 P00915 11/20 0.47
NOS1 P29475 1/20 0.45
CA12 O43570 9/20 0.44
CA9 Q16790 9/20 0.44
ELANE P08246 1/20 0.44
CA4 P22748 1/20 0.42
CA14 Q9ULX7 1/20 0.42
MEN1 O00255 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 1/20 0.40
POLB P06746 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4459281 0.88 ELANE (0.46) ELANEMEN1KMT2AMAPTPOLB
SCHEMBL19845109 0.86 ELANE (0.45) ELANEMEN1KMT2AMAPTPOLB
SCHEMBL11969976 0.84 CYP3A4 (0.56) CA2CA1NOS1CA12CA9
SCHEMBL3268579 0.82 SMN1; SMN2 (0.46) ELANEMEN1KMT2AMAPT
SCHEMBL3255441 0.82 POLB (0.44) ELANEMAPTPOLB
SCHEMBL218655 0.82 ELANE (0.56) ELANEMEN1KMT2A
SCHEMBL961163 0.81 ELANE (0.53) CA2CA1CA12CA9ELANE
SCHEMBL27403639 0.80 ELANE (0.40) CA2CA1ELANEKMT2A
SCHEMBL7782512 0.80 ELANE (0.47) CA2CA1ELANE
SCHEMBL3269510 0.79 ALDH1A1 (0.52) MEN1KMT2AMAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 643 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1038668-B1 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2005-05-25 EP claimed
EP-0914964-B1 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO LTD (JP) 2004-12-29 EP claimed
US-6355396-B1 HIGH SENSITIVITY AND GOOD LATITUDE IN DEVELOPMENT, FOR PRODUCING DIRECT PLATE PRODUCTION PROCESS AND ENABLES AN IMAGE TO BE FORMED WITH HIGH SENSITIVITY WITH AN INFRARED LASER FUJI PHOTO FILM CO., LTD. (JP) 2002-03-12 US claimed
EP-0766140-B1 Positive presensitized lithographic printing plate and a process for producing the same FUJI PHOTO FILM CO LTD (JP) 2001-04-11 EP claimed
US-6132929-A Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO., LTD. (JP) 2000-10-17 US claimed
EP-1038668-A2 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO., LTD. (JP) 2000-09-27 EP claimed
EP-0914964-A2 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO., LTD. (JP) 1999-05-12 EP claimed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US claimed
US-6423458-B1 None US disclosed
US-20210197516-A1 LAMINATE FUJIFILM CORPORATION (JP) 2021-07-01 US disclosed
CN-111295291-B Security element and security system 富士胶片株式会社 2021-05-07 CN disclosed
US-20200316914-A1 LAMINATE, COMPOSITE, AND METHOD FOR PRODUCING COMPOSITE FUJIFILM CORPORATION (JP) 2020-10-08 US disclosed
CN-111601705-A Laminate, composite, and method for producing composite 富士胶片株式会社 2020-08-28 CN disclosed
EP-3675257-A1 METAL FOIL, METAL FOIL PRODUCTION METHOD, SECONDARY BATTERY NEGATIVE ELECTRODE, AND SECONDARY BATTERY POSITIVE ELECTRODE FUJIFILM Corporation (JP) 2020-07-01 EP disclosed
US-5141838-A Lithography printing plates FUJI PHOTO FILM CO., LTD. (JP) 1992-08-25 US disclosed
EP-0492959-A1 Method for developing presensitized plate for use in making lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1992-07-01 EP disclosed
EP-0487343-A1 Process for preparing a lithographic plate Fuji Photo Film Co., Ltd. (JP) 1992-05-27 EP disclosed
US-5112743-A Aromatic-aldehyde diazo resins FUJI PHOTO FILM CO., LTD. (JP) 1992-05-12 US disclosed
EP-0399755-A1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates Fuji Photo Film Co., Ltd. (JP) 1990-11-28 EP disclosed
EP-0330239-A2 Photosensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1989-08-30 EP disclosed