SCHEMBL20437580

SCHEMBL20437580

C=CC(=O)OCC(C)CN=C=O

nearest known ligand 0.55

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.55
HPGD P15428 1/20 0.37
ALDH1A1 P00352 4/20 0.36
TP53 P04637 3/20 0.36
HIF1A Q16665 3/20 0.36
CYP3A4 P08684 2/20 0.36
HSD17B10 Q99714 1/20 0.36
MAPK1 P28482 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21019104 0.84 TSHR (0.51) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL25209089 0.84 TSHR (0.43) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1170956 0.83 TSHR (0.48) TSHRHPGDALDH1A1TP53HIF1A
Propene SCHEMBL28871904 0.82 TSHR (0.49) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL29233061 0.80 TSHR (0.47) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL8965855 0.80 TSHR (0.75) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL29233146 0.79 TSHR (0.46) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL29233170 0.79 TSHR (0.46) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL1131726 0.79 TSHR (0.62) TSHRHPGDALDH1A1TP53HIF1A
SCHEMBL10412807 0.79 TSHR (0.44) TSHRHPGDALDH1A1TP53HIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118215651-A Method for producing isocyanate compound, method for producing urethane compound, method for recovering amine compound, and isocyanate composition 旭化成株式会社 2024-06-18 CN disclosed
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 US disclosed
US-11839700-B2 Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-12-12 US disclosed
US-11530312-B2 Stretchable wiring film and method for forming the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-12-20 US disclosed
US-11530307-B2 Stretchable film and method for forming the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-12-20 US disclosed
US-11377529-B2 Composite stretchable film and method for forming same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-07-05 US disclosed
US-11142640-B2 Silicon-containing compound, urethane resin, stretchable film and method for forming the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-10-12 US disclosed
US-11078317-B2 Stretchable film and method for forming the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-08-03 US disclosed
EP-3530682-B1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND METHOD FOR FORMING THE SAME SHINETSU CHEMICAL CO (JP) 2021-03-31 EP disclosed
US-10934463-B2 Adhesive film, method for forming an adhesive film, and urethane polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-03-02 US disclosed
US-20190264028-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND METHOD FOR FORMING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-29 US disclosed
EP-3530682-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND METHOD FOR FORMING THE SAME Shin-Etsu Chemical Co., Ltd. (JP) 2019-08-28 EP disclosed
US-20190241709-A1 STRETCHABLE FILM COMPOSITION, STRETCHABLE FILM, AND METHOD FOR FORMING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-08 US disclosed
US-20190233645-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-08-01 US disclosed
US-20190209740-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, AND METHOD FOR MANUFACTURING A BIO-ELECTRODE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-07-11 US disclosed
US-20190112413-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND METHOD FOR FORMING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-18 US disclosed
US-20190106528-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND METHOD FOR FORMING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-04-11 US disclosed
US-20180215876-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE STRETCHABLE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-02 US disclosed
US-20180215876-A1 STRETCHABLE FILM AND METHOD FOR FORMING THE STRETCHABLE FILM SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-02 US disclosed
CN-104610097-A Unsaturated carbamic acid ester, unsaturated thiocarbamic acid ester, unsaturated urea compound or unsaturated amide compound SHOWA DENKO KK 2015-05-13 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190112413-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND METHOD FOR FORMING THE SAME PNISR, OR10J3, OXSR1 TSHR 648/4885HPGD 4802/4885ALDH1A1 2893/4885
US-20190106528-A1 SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND METHOD FOR FORMING THE SAME UTS2R, OXSR1, PNISR TSHR 226/4885HPGD 4671/4885ALDH1A1 2765/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.