SCHEMBL20444140

SCHEMBL20444140

COC(=O)C(CC(C)C)C(Cl)C(C)C

nearest known ligand 0.39

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ SMN1; SMN2 Q16637 2/20 0.39
▸ CA14 Q9ULX7 3/20 0.39
▸ CA12 O43570 2/20 0.39
▸ CA7 P43166 1/20 0.39
▸ CA9 Q16790 1/20 0.39
▸ MME P08473 2/20 0.37
▸ TAS1R3 Q7RTX0 3/20 0.35
▸ TAS1R1 Q7RTX1 3/20 0.35
▸ ADAM17 P78536 1/20 0.34
▸ NOS3 P29474 2/20 0.33
▸ NOS1 P29475 2/20 0.33
▸ NOS2 P35228 2/20 0.33
▸ BIRC2 Q13490 1/20 0.33
▸ POLB P06746 1/20 0.33
▸ FOLH1 Q04609 1/20 0.33
▸ CYP2C9 P11712 1/20 0.32
▸ NPR3 P17342 1/20 0.32
▸ CYP2C19 P33261 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12868880 0.83 SMN1; SMN2 (0.44) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL9911582 0.83 SMN1; SMN2 (0.44) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL5514853 0.83 SMN1; SMN2 (0.44) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL16487289 0.83 MME (0.43) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL15015675 0.75 MME (0.46) SMN1; SMN2MMETAS1R3TAS1R1FOLH1
SCHEMBL6947237 0.75 MME (0.39) SMN1; SMN2CA14MMETAS1R3TAS1R1
SCHEMBL25158974 0.74 MME (0.41) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL11435031 0.74 MME (0.41) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL16215927 0.74 MME (0.41) SMN1; SMN2CA14CA12CA7CA9
SCHEMBL14316099 0.73 BIRC2 (0.41) SMN1; SMN2MMETAS1R3TAS1R1NOS3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11042094-B2 Treatment liquid and pattern forming method FUJIFILM CORPORATION (JP) 2021-06-22 — — US disclosed
US-20180217499-A1 TREATMENT LIQUID AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2018-08-02 — — US disclosed
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