SCHEMBL20451256

SCHEMBL20451256

CC(C)N[Si](O[Si](C)(C)C)(O[Si](C)(C)C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20451284 0.77
SCHEMBL22463705 0.72
SCHEMBL30249137 0.71
SCHEMBL888371 0.69
SCHEMBL20451233 0.65
SCHEMBL495516 0.65 MEN1 (0.32)
SCHEMBL233720 0.63 TDP1 (0.33)
SCHEMBL234206 0.63 TDP1 (0.33)
SCHEMBL3329648 0.63
SCHEMBL4207907 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230167549-A1 ORGANOAMINO-POLISILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS VERSUM MAT US LLC (US) 2023-06-01 US claimed
US-11591692-B2 Organoamino-polysiloxanes for deposition of silicon-containing films VERSUM MATERIALS US, LLC (US) 2023-02-28 US claimed
CN-115584491-A Organoaminopolysiloxanes for deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2023-01-10 CN claimed
CN-110462097-B Organoaminopolysiloxanes for deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2022-11-15 CN claimed
WO-2018148201-A1 ORGANOAMINO-POLYSILOXANES FOR DEPOSITION OF SILICON-CONTAINING FILMS VERSUM MATERIALS US, LLC (US) 2018-08-16 WO claimed
US-20180223428-A1 Organoamino-Polysiloxanes For Deposition Of Silicon-Containing Films VERSUM MATERIALS US, LLC (US) 2018-08-09 US claimed
CN-115584491-A Organoaminopolysiloxanes for deposition of silicon-containing films 弗萨姆材料美国有限责任公司 2023-01-10 CN disclosed