⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Lithium SCHEMBL30713276 | 0.96 | — | — | |
| SCHEMBL27092131 | 0.96 | — | — | |
| SCHEMBL234206 | 0.75 | TDP1 (0.33) | — | |
| SCHEMBL233720 | 0.75 | TDP1 (0.33) | — | |
| Lithium SCHEMBL31129790 | 0.72 | TDP1 (0.31) | — | |
| SCHEMBL16899675 | 0.72 | — | — | |
| SCHEMBL234155 | 0.70 | TDP1 (0.36) | — | |
| SCHEMBL23014231 | 0.69 | — | — | |
| SCHEMBL30249137 | 0.69 | — | — | |
| SCHEMBL19038505 | 0.69 | TDP1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 243 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12435416-B2 | Compositions and methods using same for non-conformal deposition of silicon containing films | VERSUM MATERIALS US, LLC (US) | 2025-10-07 | — | — | US | claimed |
| US-12421603-B2 | Composition for high temperature atomic layer deposition of high quality silicon oxide thin films | VERSUM MATERIALS US, LLC (US) | 2025-09-23 | — | — | US | claimed |
| US-20250270698-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC | 2025-08-28 | — | — | US | claimed |
| EP-4493734-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | Versum Materials US, LLC (US) | 2025-01-22 | — | — | EP | claimed |
| WO-2023201271-A1 | BORON-CONTAINING PRECURSORS FOR THE ALD DEPOSITION OF BORON NITRIDE FILMS | VERSUM MATERIALS US, LLC (US) | 2023-10-19 | — | — | WO | claimed |
| EP-3663301-B1 | BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS | VERSUM MAT US LLC (US) | 2023-08-30 | — | — | EP | claimed |
| US-11649547-B2 | Deposition of carbon doped silicon oxide | VERSUM MATERIALS US, LLC (US) | 2023-05-16 | — | — | US | claimed |
| US-20220333241-A1 | COMPOSITIONS AND METHODS USING SAME FOR NON-CONFORMAL DEPOSITION OF SILICON CONTAINING FILMS | VERSUM MATERIALS US, LLC (US) | 2022-10-20 | — | — | US | claimed |
| CN-114365265-A | Compositions for non-conformal deposition of silicon-containing films and methods of using the same | 弗萨姆材料美国有限责任公司 | 2022-04-15 | — | — | CN | claimed |
| US-20210363639-A1 | COMPOSITION FOR HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF HIGH QUALITY SILICON OXIDE THIN FILMS | VERSUM MATERIALS US, LLC (US) | 2021-11-25 | — | — | US | claimed |
| EP-2650399-A2 | High temperature atomic layer deposition of silicon oxide thin films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-16 | — | — | EP | claimed |
| US-20080090985-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | claimed |
| US-20080090987-A1 | PROCESS FOR PRODUCING CONTROLLED VISCOSITY FLUOROSILICONE POLYMERS | MOMENTIVE PERFORMANCE MATERIALS INC. | 2008-04-17 | — | — | US | claimed |
| EP-0671483-B1 | Method for vapor deposition of a ceramic coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM SPA (IT) | 1997-12-29 | — | — | EP | claimed |
| EP-0540084-B1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM SPA (IT) | 1996-09-04 | — | — | EP | claimed |
| EP-0671483-A1 | Ceramic vapor deposited coating using a steam-containing carrier gas and non-alkoxy silane precursors | ENICHEM S.p.A. (IT) | 1995-09-13 | — | — | EP | claimed |
| US-5424095-A | Decomposing organosilicon precursor inside chemical reactor to form film of ceramic material on surface; prevents coking | ENIRICERCHE S.P.A. (IT) | 1995-06-13 | — | — | US | claimed |
| EP-0540084-A1 | Method for passivating the inner surface of a reactor subject to coking, by deposition of a ceramic coating, and method of pyrolyzing hydrocarbons | ENICHEM S.p.A. (IT) | 1993-05-05 | — | — | EP | claimed |
| US-5208069-A | Silane precursor | ISTITUTO GUIDO DONEGANI S.P.A. (IT) | 1993-05-04 | — | — | US | claimed |
| US-4389530-A | Pesticidally active novel phosphoric (phosphonic) acid ester amides | BAYER AKTIENGESELLSCHAFT (DE) | 1983-06-21 | — | — | US | claimed |