SCHEMBL2045706

SCHEMBL2045706

C=C1OCCCO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL644315 0.92
SCHEMBL9467005 0.89 CA1 (0.36)
SCHEMBL9466809 0.89
SCHEMBL1696722 0.87 ALDH1A1 (0.39)
SCHEMBL646132 0.84
SCHEMBL28857274 0.76
SCHEMBL7908874 0.74
SCHEMBL548341 0.72
Ethylene Glycol SCHEMBL11770499 0.69 TSHR (0.31)
SCHEMBL1696725 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 218 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4001345-B1 DEGRADABLE HYPERBRANCHED RESIN, PREPARATION METHOD THEREFOR, AND USE THEREOF UNIV SOUTH CHINA TECH (CN) 2026-04-01 EP claimed
EP-4347263-B1 PHOTORESIST FORMULATIONS FOR 3D MICROPRINTING TECHNIQUES FONDAZIONE ST ITALIANO TECNOLOGIA (IT) 2026-02-25 EP claimed
EP-4469549-B1 POLYMERIC SOIL RELEASE AGENTS HENKEL AG & CO KGAA (DE) 2026-02-04 EP claimed
EP-4551626-B1 COPOLYMERS OF CYCLIC KETENE ACETAL MONOMERS WACKER CHEMIE AG (DE) 2026-01-28 EP claimed
US-12429766-B2 Photoresist formulations 3D microprinting techniques FONDAZIONE ISTITUTO ITALIANO DI TECNOLOGIA (IT) 2025-09-30 US claimed
EP-4551626-A1 COPOLYMERS OF CYCLIC KETENE ACETAL MONOMERS Wacker Chemie AG (DE) 2025-05-14 EP claimed
WO-2025083341-A1 PREPARATION OF AN ESTER COPOLYMER COATEX - BALMEFREZOL, LUDOVIC (FR) 2025-04-24 WO claimed
CN-119546661-A Copolymers of cyclic ketene acetal monomers 瓦克化学股份公司 2025-02-28 CN claimed
EP-4469549-A1 POLYMERIC SOIL RELEASE AGENTS Henkel AG & Co. KGaA (DE) 2024-12-04 EP claimed
US-20240376404-A1 Polymeric Active Ingredients which Allow the Removal of Dirt HENKEL AG & CO. KGAA (DE) 2024-11-14 US claimed
US-20130344159-A1 IMPLANTABLE SWELLABLE BIO-RESORBABLE POLYMER OCCLUGEL (FR) 2013-12-26 US claimed
US-20130344160-A1 IMPLANTABLE BIO-RESORBABLE POLYMER CHARGED WITH FRAGILE MACROMOLECULES OCCLUGEL (FR) 2013-12-26 US claimed
WO-2012120138-A1 IMPLANTABLE SWELLABLE BIO-RESORBABLE POLYMER OCCLUGEL (FR) 2012-09-13 WO claimed
WO-2012120139-A1 IMPLANTABLE BIO-RESORBABLE POLYMER CHARGED WITH FRAGILE MACROMOLECULES OCCLUGEL (FR) 2012-09-13 WO claimed
EP-2265648-A1 HYDROLYTICALLY DECOMPOSABLE IONIC COPOLYMERS Philipps-Universität Marburg (DE) 2010-12-29 EP claimed
WO-2009127600-A1 HYDROLYTICALLY DECOMPOSABLE IONIC COPOLYMERS PHILIPPS-UNIVERSITÄT MARBURG (DE) 2009-10-22 WO claimed
US-5541275-A COPOLYMERS WITH VINYL ETHERS FOR FILMS AND PACKAGES WACKER-CHEMIE GMBH (DE) 1996-07-30 US claimed
EP-0095182-B1 PHOTOSENSITIVE RESIN COMPOSITION HITACHI, LTD. (JP) 1987-08-12 EP claimed
US-4530746-A Oxygen containing ring with vinyl substitution as monomer HITACHI, LTD. (JP) 1985-07-23 US claimed
EP-0095182-A2 Photosensitive resin composition HITACHI, LTD. (JP) 1983-11-30 EP claimed