⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL99135 | 0.77 | — | — | |
| SCHEMBL27191400 | 0.73 | — | — | |
| SCHEMBL28244892 | 0.73 | — | — | |
| SCHEMBL1141891 | 0.67 | — | — | |
| SCHEMBL1272332 | 0.64 | — | — | |
| SCHEMBL115905 | 0.64 | — | — | |
| SCHEMBL1271659 | 0.64 | — | — | |
| SCHEMBL18420104 | 0.64 | — | — | |
| SCHEMBL2816906 | 0.64 | — | — | |
| SCHEMBL404186 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | claimed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | claimed |
| US-8466310-B2 | Process for producing α-substituted norbornanyl acrylates | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-06-18 | — | — | US | claimed |
| US-20110137073-A1 | Process for Producing Alpha-Substituted Norbornanyl Acrylates | CENTRAL GLASS COMPANY, LIMITED (JP) | 2011-06-09 | — | — | US | claimed |
| US-6844134-B2 | Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-01-18 | — | — | US | claimed |
| US-6800418-B2 | ALLOWING DEVELOPMENT WITH CONVENTIONAL DEVELOPERS AND HAVING A HIGH TRANSMITTANCE AT A F2 EXCIMER LASER WAVELENGTH OF 157 NM, HYDROPHILICITY, ADHESION TO UNDERLAYER | SAMSUNG ELECTRONICS (KR) | 2004-10-05 | — | — | US | claimed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | claimed |
| US-20030125511-A1 | Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same | SUMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-03 | — | — | US | claimed |
| WO-2002021216-A9 | POLYMERS AND PHOTORESIST COMPOSITIONS COMPRISING ELECTRONEGATIVE GROUPS | SHIPLEY CO LLC (US) | 2003-04-03 | — | — | WO | claimed |
| US-20020058199-A1 | Novel polymers and photoresist compositions comprising electronegative groups | SHIPLEY COMPANY, L.L.C. | 2002-05-16 | — | — | US | claimed |
| EP-2707776-B1 | POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK AND RESIST PATTERN FORMING METHOD EACH USING THE COMPOSITION | FUJIFILM CORP (JP) | 2017-07-19 | — | — | EP | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9091927-B2 | Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| EP-2707776-A1 | POSITIVE RESIST COMPOSITION, AND RESIST FILM, RESIST-COATED MASK BLANK, RESIST PATTERN FORMING METHOD AND PHOTOMASK EACH USING THE COMPOSITION | FUJIFILM Corporation (JP) | 2014-03-19 | — | — | EP | disclosed |
| JP-2003262960-A | ELECTRON BEAM SENSITIVE RESIST COMPOSITION AND METHOD FOR MANUFACTURING STAMPER BY USING THE SAME | HITACHI LTD | 2003-09-19 | — | — | JP | disclosed |
| US-20030157430-A1 | Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. | 2003-08-21 | — | — | US | disclosed |
| US-20030125511-A1 | Photosenseitive polymer having fluorinated ethylene glycol group and chemically amplified resist compositon comprising the same | SUMSUNG ELECTRONICS CO., LTD. (KR) | 2003-07-03 | — | — | US | disclosed |
| US-4107303-A | Antihypertensive hexafluorohydroxyisopropyl benzazepines and benzazocines | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-08-15 | — | — | US | disclosed |
| US-4107303-A | Antihypertensive hexafluorohydroxyisopropyl benzazepines and benzazocines | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1978-08-15 | — | — | US | disclosed |