⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25748389 | 0.78 | — | — | |
| SCHEMBL49454 | 0.69 | — | — | |
| SCHEMBL20522693 | 0.67 | — | — | |
| SCHEMBL16582993 | 0.67 | — | — | |
| SCHEMBL18099855 | 0.67 | — | — | |
| SCHEMBL22787414 | 0.65 | — | — | |
| SCHEMBL21882093 | 0.64 | — | — | |
| SCHEMBL17691356 | 0.64 | — | — | |
| SCHEMBL16628342 | 0.64 | — | — | |
| SCHEMBL19101194 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11820654-B2 | Si-containing film forming precursors and methods of using the same | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) | 2023-11-21 | — | — | US | disclosed |
| US-11358974-B2 | Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition | DNF CO., LTD. (KR) | 2022-06-14 | — | — | US | disclosed |
| US-11358974-B2 | Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition | DNF CO., LTD. (KR) | 2022-06-14 | — | — | US | disclosed |
| US-20210395890-A1 | SI-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME | AIR LIQUIDE (FR) | 2021-12-23 | — | — | US | disclosed |
| US-11124876-B2 | Si-containing film forming precursors and methods of using the same | L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) | 2021-09-21 | — | — | US | disclosed |
| US-20200392294-A1 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2020-12-17 | — | — | US | disclosed |
| US-20200392294-A1 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2020-12-17 | — | — | US | disclosed |
| US-20190311894-A1 | Si-CONTAINING FILM FORMING PRECURSORS AND METHODS OF USING THE SAME | L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE | 2019-10-10 | — | — | US | disclosed |
| WO-2018182305-A9 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2018-11-22 | — | — | WO | disclosed |
| WO-2018182305-A1 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2018-10-04 | — | — | WO | disclosed |