⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27966739 | 0.76 | — | — | |
| SCHEMBL2100782 | 0.68 | TP53 (0.33) | — | |
| SCHEMBL35573 | 0.67 | — | — | |
| SCHEMBL17053503 | 0.67 | — | — | |
| SCHEMBL20522629 | 0.67 | — | — | |
| SCHEMBL2275379 | 0.64 | — | — | |
| SCHEMBL28265606 | 0.64 | — | — | |
| SCHEMBL21470262 | 0.61 | — | — | |
| SCHEMBL6457939 | 0.61 | — | — | |
| SCHEMBL16582919 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11358974-B2 | Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition | DNF CO., LTD. (KR) | 2022-06-14 | — | — | US | disclosed |
| US-11358974-B2 | Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the composition | DNF CO., LTD. (KR) | 2022-06-14 | — | — | US | disclosed |
| CN-110461953-B | Silylamine compound, composition for depositing silicon-containing film comprising the same, and method for manufacturing silicon-containing film using the composition | DNF有限公司 | 2021-08-27 | — | — | CN | disclosed |
| US-20200392294-A1 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2020-12-17 | — | — | US | disclosed |
| US-20200392294-A1 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2020-12-17 | — | — | US | disclosed |
| WO-2018182305-A9 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2018-11-22 | — | — | WO | disclosed |
| WO-2018182305-A1 | SILYLAMINE COMPOUND, COMPOSITION FOR DEPOSITING SILICON-CONTAINING THIN FILM CONTAINING THE SAME, AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE COMPOSITION | DNF CO., LTD. (KR) | 2018-10-04 | — | — | WO | disclosed |