SCHEMBL2058044

SCHEMBL2058044

OCCCCSCSCCCCO

nearest known ligand 0.39

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.35
LMNA P02545 2/20 0.33
ALDH1A1 P00352 2/20 0.33
TSHR P16473 2/20 0.33
HSD17B10 Q99714 1/20 0.33
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30127737 0.91 TDP1 (0.47) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL2058560 0.90 TDP1 (0.41) TDP1SMN1; SMN2ALDH1A1TSHR
SCHEMBL672598 0.86 TDP1 (0.53) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL26778912 0.84 LMNA (0.62) SMN1; SMN2LMNAALDH1A1TSHRHSD17B10
SCHEMBL16147964 0.83 LMNA (0.33) TDP1LMNAALDH1A1TSHRHSD17B10
SCHEMBL8940818 0.83 LMNA (0.33) TDP1LMNAALDH1A1TSHRHSD17B10
SCHEMBL22444517 0.83 TDP1 (0.50) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL8673529 0.83 TDP1 (0.50) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL22444464 0.83 TDP1 (0.50) TDP1SMN1; SMN2LMNAALDH1A1TSHR
SCHEMBL22444525 0.83 TDP1 (0.50) TDP1SMN1; SMN2LMNAALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3004429-B1 ELECTROPLATING BATHS OF SILVER AND TIN ALLOYS ROHM & HAAS ELECT MAT (US) 2018-07-18 EP claimed
EP-3816325-B1 ACIDIC AQUEOUS SILVER-NICKEL ALLOY ELECTROPLATING COMPOSITIONS AND METHODS DUPONT ELECTRONIC MAT INTERNATIONAL LLC (US) 2025-05-07 EP disclosed
CN-110176441-B Copper pillars with improved integrity and method of making same 罗门哈斯电子材料有限责任公司 2023-08-01 CN disclosed
EP-4098778-A1 ACIDIC AQUEOUS BINARY SILVER-BISMUTH ALLOY ELECTROPLATING COMPOSITIONS AND METHODS Rohm and Haas Electronic Materials LLC (US) 2022-12-07 EP disclosed
US-11434577-B2 Acid aqueous binary silver-bismuth alloy electroplating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2022-09-06 US disclosed
EP-3816326-B1 ACIDIC AQUEOUS BINARY SILVER-BISMUTH ALLOY ELECTROPLATING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2022-06-29 EP disclosed
US-20220112619-A1 ACIDIC AQUEOUS BINARY SILVER-BISMUTH ALLOY ELECTROPLATING COMPOSITIONS AND METHODS DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC 2022-04-14 US disclosed
US-11242609-B2 Acidic aqueous silver-nickel alloy electroplating compositions and methods Rohm and Hass Electronic Materials LLC (US) 2022-02-08 US disclosed
EP-3835459-A1 ACIDIC AQUEOUS BINARY SILVER-BISMUTH ALLOY ELECTROPLATING COMPOSITIONS AND METHODS Rohm and Haas Electronic Materials LLC (US) 2021-06-16 EP disclosed
CN-112941578-A Acidic aqueous binary silver-bismuth alloy electroplating compositions and methods 罗门哈斯电子材料有限责任公司 2021-06-11 CN disclosed
EP-2910667-B1 CYANIDE-FREE ACIDIC MATTE SILVER ELECTROPLATING COMPOSITIONS AND METHODS ROHM & HAAS ELECT MAT (US) 2016-04-27 EP disclosed
EP-3004429-A1 ELECTROPLATING BATHS OF SILVER AND TIN ALLOYS Rohm and Haas Electronic Materials LLC (US) 2016-04-13 EP disclosed
EP-3002350-A1 CYANIDE-FREE ELECTROPLATING BATHS FOR WHITE BRONZE BASED ON COPPER (I) IONS Rohm and Haas Electronic Materials LLC (US) 2016-04-06 EP disclosed
US-20150240375-A1 CYANIDE-FREE ACIDIC MATTE SILVER ELECTROPLATING COMPOSITIONS AND METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2015-08-27 US disclosed
EP-2910667-A1 CYANIDE-FREE ACIDIC MATTE SILVER ELECTROPLATING COMPOSITIONS AND METHODS Rohm and Haas Electronic Materials LLC (US) 2015-08-26 EP disclosed
WO-2014165867-A1 ELECTROPLATING BATHS OF SILVER AND TIN ALLOYS ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-10-09 WO disclosed
US-7968444-B2 Lead-free tin alloy electroplating compositions and methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2011-06-28 US disclosed
US-20100216302-A1 Lead-free tin alloy electroplating compositions and methods ROHM AND HAAS ELECTRONICS MATERIALS LLC (US) 2010-08-26 US disclosed
EP-2221396-A1 Lead-Free Tin Alloy Electroplating Compositions and Methods Rohm and Haas Electronic Materials LLC (US) 2010-08-25 EP disclosed
US-5162585-A Preparation of dihydroxy bis-sulfides PHILLIPS PETROLEUM COMPANY (US) 1992-11-10 US disclosed