Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 5/20 | 0.69 |
| ▸ | CA6 | P23280 | 5/20 | 0.69 |
| ▸ | CA7 | P43166 | 5/20 | 0.69 |
| ▸ | CA9 | Q16790 | 5/20 | 0.69 |
| ▸ | CA14 | Q9ULX7 | 5/20 | 0.69 |
| ▸ | CA5B | Q9Y2D0 | 5/20 | 0.69 |
| ▸ | CA2 | P00918 | 4/20 | 0.69 |
| ▸ | CA4 | P22748 | 4/20 | 0.69 |
| ▸ | CA5A | P35218 | 4/20 | 0.69 |
| ▸ | LMNA | P02545 | 3/20 | 0.69 |
| ▸ | CA3 | P07451 | 3/20 | 0.69 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.69 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.69 |
| ▸ | CA1 | P00915 | 2/20 | 0.69 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.69 |
| ▸ | TP53 | P04637 | 1/20 | 0.69 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.65 |
| ▸ | MEN1 | O00255 | 2/20 | 0.62 |
| ▸ | RECQL | P46063 | 2/20 | 0.62 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.62 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10885036 | 1.00 | CA12 (0.69) | CA12CA6CA7CA9CA14 | |
| SCHEMBL1627711 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL2436614 | 0.97 | KDM4E (0.71) | CA12CA6CA7CA9CA14 | |
| SCHEMBL125862 | 0.94 | — | — | |
| Bicarbonate SCHEMBL6013940 | 0.89 | CA12 (0.55) | CA12CA6CA7CA9CA14 | |
| Ethylene Glycol SCHEMBL11507834 | 0.84 | CA12 (0.73) | CA12CA6CA7CA9CA14 | |
| Monoethanolamine SCHEMBL9064478 | 0.84 | CA12 (0.73) | CA12CA6CA7CA9CA14 | |
| SCHEMBL25340653 | 0.83 | CA12 (1.00) | CA12CA6CA7CA9CA14 | |
| SCHEMBL15797 | 0.83 | CA12 (1.00) | CA12CA6CA7CA9CA14 | |
| SCHEMBL25342922 | 0.83 | CA12 (1.00) | CA12CA6CA7CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | claimed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | claimed |
| US-8163095-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-04-24 | — | — | US | disclosed |
| US-20110206829-A1 | COMPOSITION FOR STRIPPING AND STRIPPING METHOD | SAMSUNG DISPLAY CO., LTD. (KR) | 2011-08-25 | — | — | US | disclosed |
| US-7968507-B2 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2011-06-28 | — | — | US | disclosed |
| US-20090084406-A1 | Composition for stripping and stripping method | SAMSUNG ELECTRONICS CO., LTD. | 2009-04-02 | — | — | US | disclosed |
| US-6638694-B2 | Mixtures of amines, water soluble solvents and corrosion resistance agents, used for removing photoresist films and residues after etching semiconductor integrated circuits or liquid crystal displays | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2003-10-28 | — | — | US | disclosed |
| US-20030186175-A1 | RESIST STRIPPING AGENT AND PROCESS OF PRODUCING SEMICONDUCTOR DEVICES USING THE SAME | IKEMOTO KAZUTO (JP) | 2003-10-02 | — | — | US | disclosed |
| EP-1031884-A2 | Resist stripping agent and process of producing semiconductor devices using the same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-08-30 | — | — | EP | disclosed |