SCHEMBL2058719

SCHEMBL2058719

Fc1c(F)c(F)c([Si](Cl)(Cl)Cl)c(F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4734742 0.92
SCHEMBL13231953 0.90
SCHEMBL13231943 0.87
SCHEMBL3129507 0.77
SCHEMBL3141756 0.77
SCHEMBL13231884 0.76 TSHR (0.32)
SCHEMBL3136670 0.74
SCHEMBL5168031 0.74
SCHEMBL523088 0.72 ALDH1A1 (0.31)
SCHEMBL28962159 0.72 ALDH1A1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11904352-B2 Low dielectric constant film and preparation method thereof JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2024-02-20 US claimed
WO-2023139121-A1 INTERFACIALLY POLYMERISED POLYAMIDE MEMBRANE FOR REVERSE OSMOSIS WITH SILANE ADDITIVE AQUAPORIN A/S (DK) 2023-07-27 WO claimed
US-20220314271-A1 Low Dielectric Constant Film and Preparation Method Thereof JIANGSU FAVORED NANOTECHNOLOGY CO., LTD. (CN) 2022-10-06 US claimed
CN-110028691-B Method of manufacturing surface-modified polymer film and method of fabricating organic electronic device including the same 纳米基盘柔软电子素子研究团 2022-06-14 CN claimed
EP-3971320-A1 LOW DIELECTRIC CONSTANT FILM AND PREPARATION METHOD THEREOF Jiangsu Favored Nanotechnology Co., Ltd. (CN) 2022-03-23 EP claimed
US-11050024-B2 Method of manufacturing surface-modified polymer film and method of fabricating organic electronic device comprising the same CENTER FOR ADVANCED SOFT ELECTRONICS (KR) 2021-06-29 US claimed
CN-110158052-B Low dielectric constant film and method for producing the same 江苏菲沃泰纳米科技股份有限公司 2021-05-14 CN claimed
EP-3498763-B1 METHOD OF MANUFACTURING SURFACE-MODIFIED POLYMER FILM AND METHOD OF FABRICATING ORGANIC ELECTRONIC DEVICE COMPRISING THE SAME CT ADVANCED SOFT ELECTRONICS (KR) 2021-03-10 EP claimed
CN-110158052-A Film having low dielectric constant and preparation method thereof 江苏菲沃泰纳米科技有限公司 2019-08-23 CN claimed
CN-110028691-A The method for manufacturing the organic electronic device of method and production comprising the modified polymer film in the surface of the modified polymer film in surface 纳米基盘柔软电子素子研究团 2019-07-19 CN claimed
US-20190181343-A1 METHOD OF MANUFACTURING SURFACE-MODIFIED POLYMER FILM AND METHOD OF FABRICATING ORGANIC ELECTRONIC DEVICE COMPRISING THE SAME POSTECH Research and Business Development Foundation (KR) 2019-06-13 US claimed
EP-2938681-B1 FLUID LEVEL SENSING TANK MATERIALS FUNAI ELECTRIC CO (JP) 2017-07-26 EP claimed
EP-2938681-A1 FLUID LEVEL SENSING TANK MATERIALS Funai Electric Co., Ltd. (JP) 2015-11-04 EP claimed
CN-104968733-A Fluid level sensing tank materials FUNAI ELECTRIC CO 2015-10-07 CN claimed
WO-2014102344-A1 FLUID LEVEL SENSING TANK MATERIALS FUNAI ELECTRIC CO., LTD. (JP) 2014-07-03 WO claimed
US-20140183087-A1 Fluid Level Sensing Tank Materials FUNAI ELECTRIC CO., LTD. (JP) 2014-07-03 US claimed
US-12611617-B2 Chromatographic columns and separation devices comprising a superficially porous material; and use thereof for supercritical fluid chromatography and other chromatography WATERS TECHNOLOGIES CORPORATION (US) 2026-04-28 US disclosed
US-12554198-B2 Functional hydrogen silsesquioxane resins and the use thereof PIBOND OY (FI) 2026-02-17 US disclosed
US-5098981-A POLYORGANOSILOXANE CHISSO CORPORATION (JP) 1992-03-24 US disclosed
EP-0349920-A2 Polyorganosiloxane Chisso Corporation (JP) 1990-01-10 EP disclosed