SCHEMBL2059978

SCHEMBL2059978

CC1(C)C=C(OC(=O)c2ccccc2)CC(C)(C)N1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 7/20 0.52
▸ MEN1 O00255 1/20 0.52
▸ MAPK1 P28482 1/20 0.52
▸ GAA P10253 1/20 0.48
▸ MAPT P10636 5/20 0.43
▸ HPGD P15428 3/20 0.43
▸ ALDH1A1 P00352 2/20 0.43
▸ SMN1; SMN2 Q16637 1/20 0.41
▸ CYP3A4 P08684 1/20 0.41
▸ CYP2D6 P10635 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ GLA P06280 1/20 0.40
▸ PARP10 Q53GL7 1/20 0.40
▸ TSHR P16473 1/20 0.40
▸ NPSR1 Q6W5P4 1/20 0.39
▸ LMNA P02545 2/20 0.38
▸ EZH2 Q15910 1/20 0.38
▸ F2 P00734 1/20 0.38
▸ TDP1 Q9NUW8 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25440299 0.70 KMT2A (0.76) KMT2AMEN1MAPK1GAAMAPT
SCHEMBL4252918 0.69 KMT2A (1.00) KMT2AMEN1MAPK1GAAMAPT
SCHEMBL9328239 0.66 GAA (0.73) KMT2AMEN1MAPK1GAAALDH1A1
SCHEMBL3143807 0.65 KMT2A (0.53) KMT2AMEN1MAPK1GAAMAPT
SCHEMBL31197024 0.65 KMT2A (0.53) KMT2AMEN1MAPTHPGDALDH1A1
SCHEMBL5599103 0.65 KMT2A (0.49) KMT2AMEN1MAPK1GAAALDH1A1
SCHEMBL30755222 0.65 KMT2A (0.41) KMT2AMEN1MAPK1GAAMAPT
SCHEMBL97715 0.65 GAA (1.00) KMT2AMEN1MAPK1GAATSHR
SCHEMBL2884285 0.65 KMT2A (0.56) KMT2AMEN1MAPK1GAAMAPT
SCHEMBL9663679 0.64 PARP10 (0.81) KMT2AMEN1MAPTALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-54097588-A — — None — — JP disclosed
US-20230041434-A1 FLEXIBLE FOAM COVESTRO DEUTSCHLAND AG (DE) 2023-02-09 — — US disclosed
EP-4081567-A1 FLEXIBLE FOAM Covestro Deutschland AG (DE) 2022-11-02 — — EP disclosed
CN-114829440-A Flexible foam 科思创德国股份有限公司 2022-07-29 — — CN disclosed
EP-3875509-A1 FLEXIBLE FOAM Covestro Deutschland AG (DE) 2021-09-08 — — EP disclosed
EP-1199613-B1 Method for removing deposit from image substrate and image formation apparatus using the method RICOH CO LTD (JP) 2015-12-09 — — EP disclosed
US-8304153-B2 Electrophotographic photoreceptor, electrophotographic image forming method, electrophotographic image forming apparatus, electrophotographic process cartridge RICOH COMPANY, LTD. (JP) 2012-11-06 — — US disclosed
US-20110059392-A1 ELECTROPHOTOGRAPHIC PHOTORECEPTOR, ELECTROPHOTOGRAPHIC IMAGE FORMING METHOD, ELECTROPHOTOGRAPHIC IMAGE FORMING APPARATUS, AND ELECTROPHOTOGRAPHIC PROCESS CARTRIDGE RICOH COMPANY, LTD. (JP) 2011-03-10 — — US disclosed
US-7709170-B2 Latent electrostatic image bearing member, and process cartridge, image forming apparatus and image forming method RICOH COMPANY, LTD. (JP) 2010-05-04 — — US disclosed
US-20060286473-A1 Latent electrostatic image bearing member, and process cartridge, image forming apparatus and image forming method RICOH COMPANY, LTD. (JP) 2006-12-21 — — US disclosed
US-6902858-B2 Image formation apparatus using a dry two-component developer for development RICOH COMPANY, LTD. (JP) 2005-06-07 — — US disclosed
US-20040179861-A1 Image formation apparatus using a dry two-component developer for development MOCHIZUKI SATOSHI (JP) 2004-09-16 — — US disclosed
US-6757507-B2 RIGID QUANTITY CONTROLLER FACING THE MAGNETIC BODY; DOCTOR GAP RICOH COMPANY, LTD. (JP) 2004-06-29 — — US disclosed
US-6560438-B2 Method for removing deposit from image substrate and image formation apparatus using the method RICOH COMPANY, LTD. (JP) 2003-05-06 — — US disclosed
US-20020181971-A1 Image formation apparatus using a dry two-component developer for development RICOH COMPANY, LTD. (JP) 2002-12-05 — — US disclosed
US-20020037189-A1 Method for removing deposit from image substrate and image formation apparatus using the method RICOH COMPANY, LTD. (JP) 2002-03-28 — — US disclosed
US-5319016-A Blend of vinyl polymer, modified polyolefin and hydrogenated vinyl-aliphatic diene block polymer in solvent CHISSO CORPORATION (JP) 1994-06-07 — — US disclosed
EP-0406828-B1 Emulsion adhesive composition and process for production thereof CHISSO CORP (JP) 1994-05-11 — — EP disclosed
JP-S5497588-A PHOSPHITE COMPOUND ADEKA ARGUS CHEM CO LTD 1979-08-01 — — JP disclosed
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