⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL859679 | 0.75 | — | — | |
| SCHEMBL12286847 | 0.75 | — | — | |
| SCHEMBL18696906 | 0.73 | — | — | |
| SCHEMBL12187157 | 0.69 | — | — | |
| SCHEMBL44598 | 0.67 | — | — | |
| SCHEMBL16149753 | 0.67 | — | — | |
| SCHEMBL2598251 | 0.65 | — | — | |
| SCHEMBL13577716 | 0.65 | — | — | |
| SCHEMBL8006184 | 0.65 | — | — | |
| SCHEMBL18346705 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220179306-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2022-06-09 | — | — | US | disclosed |
| US-10976661-B2 | Resist composition, method of forming resist pattern, and polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-04-13 | — | — | US | disclosed |
| US-20200150531-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-05-14 | — | — | US | disclosed |
| US-20190018319-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-01-17 | — | — | US | disclosed |