Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | BLM | P54132 | 1/20 | 0.31 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.31 |
| ▸ | PIK3CD | O00329 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24294605 | 0.91 | HSD17B10 (0.38) | HSD17B10MEN1POLBKMT2AALDH1A1 | |
| SCHEMBL16365047 | 0.89 | — | — | |
| SCHEMBL8578960 | 0.87 | MEN1 (0.48) | HSD17B10MEN1POLBKMT2AALDH1A1 | |
| SCHEMBL25841672 | 0.82 | HSD17B10 (0.41) | HSD17B10BLMPMP22 | |
| SCHEMBL14577269 | 0.81 | CA12 (0.38) | HSD17B10PMP22PIK3CDALDH1A1 | |
| SCHEMBL11535497 | 0.80 | SCN4A (0.33) | — | |
| SCHEMBL8422948 | 0.79 | HSD17B10 (0.58) | HSD17B10MEN1POLBKMT2ABLM | |
| SCHEMBL723497 | 0.78 | HSD17B10 (0.41) | HSD17B10ALDH1A1 | |
| SCHEMBL21554997 | 0.77 | PIK3CD (0.32) | HSD17B10PIK3CDALDH1A1 | |
| SCHEMBL15182727 | 0.77 | CA12 (0.44) | HSD17B10PMP22PIK3CDALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8148053-B2 | DNA sequenceing, biochemical immobilization, and genetic diagnosis; forming monomolecular film using (alkoxyalkoxy)alkylsilane(triol and/or halide) such as 10-(methoxymethoxy)dodecyltrimethoxysilane which forms hydroxyl groups when exposed to acid; forming polysulfonates; radiation with high energy beams | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-04-03 | — | — | US | disclosed |
| US-20080233409-A1 | With monomolecular film having silicon oxide chain; formed in presence of nitrogen containing organic base; preventing detachment when target molecule is immobilized on substrate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080233309-A1 | Method for manufacturing substrate for making microarray | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-09-25 | — | — | US | disclosed |
| US-7211367-B2 | Photo acid generator, chemical amplification resist material | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-01 | — | — | US | disclosed |
| US-7090961-B2 | Photo acid generator, chemical amplification resist material and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-08-15 | — | — | US | disclosed |
| US-20060160023-A1 | Photo acid generator, chemical amplification resist material and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. | 2006-07-20 | — | — | US | disclosed |
| US-20030224290-A1 | Photo acid generator, chemical amplification resist material and pattern formation method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-12-04 | — | — | US | disclosed |