SCHEMBL20657367

SCHEMBL20657367

CC(C)(C)OC(=O)SCC(=O)OCC(COC(=O)CSC(=O)OC(C)(C)C)(COC(=O)CSC(=O)OC(C)(C)C)COC(=O)CSC(=O)OC(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20657368 0.82 HDAC3 (0.33)
SCHEMBL17870857 0.76 HDAC3 (0.34) CYP2C19
SCHEMBL23336422 0.76 HDAC3 (0.31)
SCHEMBL27781148 0.72 ALDH1A1 (0.35)
SCHEMBL802277 0.71 USP2 (0.34)
SCHEMBL26932127 0.69
SCHEMBL20657366 0.69 CA1 (0.31)
SCHEMBL20438455 0.67 MAPK1 (0.31)
SCHEMBL17639952 0.67 USP2 (0.32)
SCHEMBL26931731 0.67 TSHR (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20190025699-A1 FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD JSR CORPORATION (JP) 2019-01-24 US disclosed