SCHEMBL20690192

SCHEMBL20690192

O=C(CC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.53
▸ KMT2A Q03164 3/20 0.53
▸ CYP3A4 P08684 2/20 0.53
▸ HPGD P15428 2/20 0.53
▸ CES1 P23141 2/20 0.53
▸ MAPK1 P28482 2/20 0.53
▸ MAPT P10636 2/20 0.53
▸ TDP1 Q9NUW8 2/20 0.53
▸ KDM4E B2RXH2 1/20 0.53
▸ ALOX15 P16050 1/20 0.53
▸ SMN1; SMN2 Q16637 1/20 0.53
▸ PTPN1 P18031 3/20 0.47
▸ ERCC5 P28715 1/20 0.47
▸ FEN1 P39748 1/20 0.47
▸ PLOD2 O00469 5/20 0.46
▸ POLB P06746 2/20 0.45
▸ PLOD3 O60568 3/20 0.45
▸ PLOD1 Q02809 3/20 0.45
▸ ALDH1A1 P00352 3/20 0.44
▸ HIF1A Q16665 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30466754 0.98 MEN1 (0.52) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL7581750 0.98 MEN1 (0.52) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL11836186 0.98 MEN1 (0.52) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL7587858 0.98 MEN1 (0.52) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL2262230 0.95 MEN1 (0.55) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL1682774 0.87 MEN1 (0.59) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL1999729 0.85 PLOD2 (0.56) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL4600257 0.85 ERCC5 (0.54) MEN1KMT2ACYP3A4HPGDCES1
SCHEMBL10874718 0.83 HTT (0.50) MEN1KMT2AHPGDCES1MAPT
SCHEMBL11946962 0.81 PLOD2 (0.45) MEN1KMT2ACYP3A4HPGDCES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11643561-B2 Process for the preparation of metallic nano-particle layers and their use for decorative or security elements BASF SE 2023-05-09 — — US disclosed
US-11643561-B2 Process for the preparation of metallic nano-particle layers and their use for decorative or security elements BASF SE 2023-05-09 — — US disclosed
US-20200230646-A1 PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORATIVE OR SECURITY ELEMENTS BASF SE (DE) 2020-07-23 — — US disclosed
WO-2019020682-A1 PROCESS FOR THE PREPARATION OF METALLIC NANO-PARTICLE LAYERS AND THEIR USE FOR DECORA-TIVE OR SECURITY ELEMENTS BASF SE (DE) 2019-01-31 — — WO disclosed
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