SCHEMBL207

SCHEMBL207

C[Si](C)(C)c1ncc[nH]1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL140714 0.93 ALDH1A1 (0.42)
Pyridine SCHEMBL9722379 0.87 ALDH1A1 (0.38)
Acetamide SCHEMBL28781848 0.85 CSNK1A1 (0.38)
SCHEMBL15140518 0.83 ALDH1A1 (0.48)
SCHEMBL28418820 0.79
SCHEMBL28540621 0.78 CYP19A1 (0.33)
SCHEMBL1374565 0.77 ALDH1A1 (0.46)
SCHEMBL1054934 0.75 ALDH1A1 (0.41)
SCHEMBL4964412 0.72 ALDH1A1 (0.42)
SCHEMBL22589073 0.72 ALDH1A1 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2632 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4632004-A1 COMPOSITION, CURABLE COMPOSITION, CURED BODY, OPTICAL PRODUCT, LENS, EYEGLASSES, ANTIMICROBIAL/ANTIVIRAL AGENT, AND RESIN COMPOSITION TOKUYAMA CORPORATION (JP) 2025-10-15 EP claimed
US-12435416-B2 Compositions and methods using same for non-conformal deposition of silicon containing films VERSUM MATERIALS US, LLC (US) 2025-10-07 US claimed
US-12421603-B2 Composition for high temperature atomic layer deposition of high quality silicon oxide thin films VERSUM MATERIALS US, LLC (US) 2025-09-23 US claimed
WO-2025104679-A1 PROCESSES FOR MAKING INTERMEDIATES FOR ISOINDOLINONE INHIBITORS OF THE MDM2-P53 INTERACTION HAVING ANTICANCER ACTIVITY OTSUKA PHARMACEUTICAL CO., LTD. (JP) 2025-05-22 WO claimed
CN-119900018-A Composition for high temperature atomic layer deposition of high quality silicon oxide films 弗萨姆材料美国有限责任公司 2025-04-29 CN claimed
CN-115677774-B Phosphonate derivatives, process for their preparation and their use 上海医药工业研究院有限公司 2025-04-22 CN claimed
CN-119738318-A Method and device for detecting wettability of electrolyte 北京新能源汽车股份有限公司 2025-04-01 CN claimed
WO-2025015659-A1 METHOD FOR SYNTHESIZING AMIDE AND/OR POLYPEPTIDE BY TAKING TRANSIENTLY PROTECTED AMINO ACID AS AMMONIA COMPONENT 广州医科大学 2025-01-23 WO claimed
CN-119219529-A Preparation method of high-purity methyl disulfonic acid 苏州祺添新材料股份有限公司 2024-12-31 CN claimed
CN-119219528-A Preparation method of high-purity methyldisulfonate 苏州祺添新材料股份有限公司 2024-12-31 CN claimed
US-4983715-A FROM CARBOXYLIC ANHYDRIDE AND AMINE NIPPON PAINT CO., LTD. (JP) 1991-01-08 US claimed
US-4983670-A Cellulose acetate bound photosensitizer for producing singlet oxygen ALLIED-SIGNAL INC. (US) 1991-01-08 US claimed
EP-0392326-A1 Dichloro-substituted imidazole derivatives as antifungal agents SOCIEDAD ESPANOLA DE ESPECIALIDADES FARMACO-TERAPEUTICAS, S.A. (ES) 1990-10-17 EP claimed
WO-1990006955-A1 CELLULOSE ACETATE BOUND PHOTOSENSITIZER FOR PRODUCING SINGLET OXYGEN ALLIED-SIGNAL INC. (US) 1990-06-28 WO claimed
EP-0336428-A2 Curable composition NIPPON PAINT CO., LTD. (JP) 1989-10-11 EP claimed
EP-0138403-B1 PROCESS FOR PREPARING PHOSPHINIC ACID INTERMEDIATES E.R. Squibb &amp; Sons, Inc. (US) 1989-03-15 EP claimed
US-4602092-A Method for making phosphinic acid intermediates E. R. SQUIBB & SONS, INC. (US) 1986-07-22 US claimed
US-4533369-A POLYMERIC MEMBRANE AND TERTIARY CARBON OR TERTIARY ORGANIC SILICONCONTAINING COMPOUND ON ONE SIDE SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1985-08-06 US claimed
EP-0138403-A2 Process for preparing phosphinic acid intermediates E.R. Squibb &amp; Sons, Inc. (US) 1985-04-24 EP claimed
US-4157894-A USING POLYSTYRENE OR PHENOL-FORMALDEHYDE RESIN TO ABSORB ACTIVE SAPONINS, SILYLATION, SEPARATION BY GAS-LIQUID CHROMATOGRAPHY INVERNI DELLA BEFFA S.P.A. (IT) 1979-06-12 US claimed