⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2081230 | 0.76 | — | — | |
| SCHEMBL2080304 | 0.74 | — | — | |
| SCHEMBL712290 | 0.72 | — | — | |
| SCHEMBL14791308 | 0.71 | HTT (0.35) | — | |
| SCHEMBL15861622 | 0.71 | — | — | |
| SCHEMBL2078900 | 0.70 | — | — | |
| SCHEMBL2080259 | 0.70 | — | — | |
| SCHEMBL10006293 | 0.69 | — | — | |
| SCHEMBL4983668 | 0.69 | — | — | |
| SCHEMBL52211 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250296918-A1 | METHOD FOR PRODUCING MERCAPTO HETEROCYCLIC COMPOUND AND METHOD FOR TESTING THE SAME | RESONAC CORPORATION (JP) | 2025-09-25 | — | — | US | disclosed |
| WO-2023210608-A1 | PRODUCTION METHOD AND TEST METHOD FOR MERCAPTO HETEROCYCLIC COMPOUND | 株式会社レゾナック | 2023-11-02 | — | — | WO | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| US-20230273521-A1 | CHEMICALLY AMPLIFIED PHOTOSENTIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-08-31 | — | — | US | disclosed |
| US-20230244145-A1 | SILICON-CONTAINING MONOMER MIXTURE, POLYSILOXANE, RESIN COMPOSITION, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, PRODUCTION METHOD FOR CURED FILM, PATTERNED CURED FILM, AND PRODUCTION METHOD FOR PATTERNED CURED FILM | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-08-03 | — | — | US | disclosed |
| US-20230229084-A1 | CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, PRODUCTION METHOD OF SUBSTRATE HAVING TEMPLATE FOR PLATING, AND PRODUCTION METHOD OF PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-07-20 | — | — | US | disclosed |
| US-20230127914-A1 | RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-20230127914-A1 | RESIST PATTERN FORMATION METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| US-11550221-B2 | Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template, method of manufacturing plated article, and nitrogen-containing aromatic heterocyclic compound | TOKYO OHKA KOG YO CO., LTD. (JP) | 2023-01-10 | — | — | US | disclosed |
| US-6114318-A | ANTIINFLAMMATORY AGENT, ANTIALLERGENS | GLAXO GROUP LIMITED (GB) | 2000-09-05 | — | — | US | disclosed |
| EP-0883628-B1 | 17BETA-(2-OXO-TETRAHYDROFURAN-4-YL)-THIO-ANDROSTANE DERIVATIVES (17BETA-(GAMMA-BUTYRIC ACID LACTONE)-THIO DERIVATIVES) FOR THE TREATMENT OF INFLAMMATION AND PHARMACEUTICAL COMPOSITIONS AND A PROCESS FOR THE PRODUCTION THEREOF | GLAXO GROUP LTD (GB) | 2000-08-16 | — | — | EP | disclosed |
| EP-0876393-B1 | 21-(2-OXO-TETRAHYDROFURAN)-THIO PREGNANE DERIVATIVES, A PROCESS FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | GLAXO GROUP LTD (GB) | 2000-07-05 | — | — | EP | disclosed |
| EP-0998484-A1 | THARAPEUTICALLY ACTIVE COMPOUNDS WITH LOW SYSTEMIC ACTIVITY DUE TO REDUCED HALF-LIFE | GLAXO GROUP LIMITED (GB) | 2000-05-10 | — | — | EP | disclosed |
| US-6013244-A | AS ANTI-INFLAMMATORY OR ANTI-ALLERGIC AGENTS | GLAXO WELLCOME INC. (US) | 2000-01-11 | — | — | US | disclosed |
| WO-1999001467-A2 | THERAPEUTICALLY ACTIVE COMPOUNDS WITH LOW SYSTEMIC ACTIVITY DUE TO REDUCE HALF LIFE | GLAXO GROUP LIMITED (GB) | 1999-01-14 | — | — | WO | disclosed |
| EP-0883628-A1 | 17BETA-(2-OXO-TETRAHYDROFURAN-4-YL)-THIO-ANDROSTANE DERIVATIVES (17BETA-(GAMMA-BUTYRIC ACID LACTONE)-THIO DERIVATIVES) FOR THE TREATMENT OF INFLAMMATION AND PHARMACEUTICAL COMPOSITIONS AND A PROCESS FOR THE PRODUCTION THEREOF | GLAXO GROUP LIMITED (GB) | 1998-12-16 | — | — | EP | disclosed |
| EP-0876393-A1 | 21-(2-OXO-TETRAHYDROFURAN)-THIO PREGNANE DERIVATIVES, A PROCESS FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | GLAXO GROUP LIMITED (GB) | 1998-11-11 | — | — | EP | disclosed |
| WO-1997024368-A1 | 17BETA-(2-OXO-TETRAHYDROFURAN-4-YL)-THIO-ANDROSTANE DERIVATIVES (17BETA-(GAMMA-BUTYRIC ACID LACTONE)-THIO DERIVATIVES) FOR THE TREATMENT OF INFLAMMATION AND PHARMACEUTICAL COMPOSITIONS AND A PROCESS FOR THE PRODUCTION THEREOF | GLAXO GROUP LIMITED (GB) | 1997-07-10 | — | — | WO | disclosed |
| WO-1997024367-A1 | 21-(2-OXO-TETRAHYDROFURAN)-THIO PREGNANE DERIVATIVES, A PROCESS FOR THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | GLAXO GROUP LIMITED (GB) | 1997-07-10 | — | — | WO | disclosed |