SCHEMBL712290

SCHEMBL712290

O=C1CC(Br)CO1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2078702 0.72
SCHEMBL14791308 0.71 HTT (0.35)
SCHEMBL25379120 0.70
SCHEMBL10006293 0.69
SCHEMBL52211 0.67
SCHEMBL6037215 0.67
SCHEMBL15047805 0.67
SCHEMBL3412400 0.67
SCHEMBL45956 0.67
SCHEMBL2639644 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10766992-B2 Resin and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-09-08 US disclosed
US-20170133709-A1 LITHIUM-ION BATTERY AND METHOD FOR PRODUCING A LITHIUM-ION BATTERY Lithium Energy and Power GmbH & Co. KG (DE) 2017-05-11 US disclosed
EP-3166164-A1 METHOD FOR PRODUCING A LITHIUM ION BATTERY AND LITHIUM ION BATTERY Lithium Energy and Power GmbH & Co. KG (DE) 2017-05-10 EP disclosed
US-9268226-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-02-23 US disclosed
EP-1457837-B1 Developing solution for heat-sensitive lithographic printing plate precursor and method for peparing lithographic printing plate FUJIFILM CORP (JP) 2016-02-17 EP disclosed
US-9221785-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-12-29 US disclosed
US-9051405-B2 Resin and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-09 US disclosed
US-20150132698-A1 RESIN AND RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-05-14 US disclosed
US-8735044-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2014-05-27 US disclosed
US-20140046046-A1 GLUCOPYRANOSYL-SUBSTITUTED PHENYL DERIVATES, MEDICAMENTS CONTAINING SUCH COMPOUNDS, THEIR USE AND PROCESS FOR THEIR MANUFACTURE BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2014-02-13 US disclosed
EP-1041442-A1 Chemical amplification type positive resist SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-10-04 EP disclosed
EP-1020767-A1 Chemical amplification type positive resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2000-07-19 EP disclosed
EP-0272605-A2 Process for the preparation of derivatives of optically active 2-hydroxy-butyric acid F. HOFFMANN-LA ROCHE AG (CH) 1988-06-29 EP disclosed
EP-0046138-B1 PROCESS FOR THE PREPARATION OF 3-(N-ARYLAMINO)-TETRAHYDROTHIOPHEN-2-ONE DERIVATIVES CIBA-GEIGY AG (CH) 1985-12-04 EP disclosed
US-4414017-A PLANT GROWTH REGULATORS CHEVRON RESEARCH COMPANY (US) 1983-11-08 US disclosed
EP-0018830-B1 SPIROBENZOFURANONES, THEIR PRODUCTION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM Takeda Chemical Industries, Ltd. (JP) 1983-06-08 EP disclosed
US-4368327-A REACTION OF CORRESPONDING FURANONE WITH SALT OF THIOCARBOXYLIC ACID CIBA-GEIGY CORPORATION (US) 1983-01-11 US disclosed
EP-0046138-A1 Process for the preparation of 3-(N-arylamino)-tetrahydrothiophen-2-one derivatives CIBA-GEIGY AG (CH) 1982-02-17 EP disclosed
EP-0018830-A2 Spirobenzofuranones, their production and pharmaceutical compositions containing them Takeda Chemical Industries, Ltd. (JP) 1980-11-12 EP disclosed
US-3933860-A FUNGICIDES CHEVRON RESEARCH COMPANY (US) 1976-01-20 US disclosed