SCHEMBL208322

SCHEMBL208322

CCC([SiH2]C(OC)OC)SSC(CC)[SiH2]C(OC)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL555460 0.91
SCHEMBL27995710 0.81
SCHEMBL208923 0.78 THRB (0.33)
SCHEMBL6142917 0.70
SCHEMBL554384 0.70 THRB (0.31)
SCHEMBL27955359 0.67
SCHEMBL1397085 0.67
SCHEMBL748516 0.67
SCHEMBL554888 0.65
SCHEMBL28119499 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250326936-A1 ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM MAXTERIAL INC (US) 2025-10-23 US disclosed
US-12173166-B2 Articles including surface coatings and methods to produce them MAXTERIAL, INC. (US) 2024-12-24 US disclosed
US-20200103121-A1 OVENS AND ARTICLES WITH OLEOPHOBIC SURFACE COATINGS HAGHDOOST ATIEH (US) 2020-04-02 US disclosed
US-20190186035-A1 ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM MAXTERIAL INC (US) 2019-06-20 US disclosed
US-8889812-B2 Aqueous silane systems based on tris(alkoxysilylalkyl)amines and the use thereof EVONIK DEGUSSA GMBH (DE) 2014-11-18 US disclosed
US-8853312-B2 Resin composition and semiconductor device produced by using the same SUMITOMO BAKELITE CO., LTD (JP) 2014-10-07 US disclosed
US-8772432-B2 2014-07-08 US disclosed
US-8754178-B2 Resin composition and semiconductor device produced using resin composition SUMITOMO BAKELITE CO., LTD. (JP) 2014-06-17 US disclosed
EP-1736520-B1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME SUMITOMO BAKELITE CO (JP) 2014-04-30 EP disclosed
US-20140069293-A1 AQUEOUS SILANE SYSTEMS BASED ON TRIS(ALKOXYSILYLALKYL)AMINES AND THE USE THEREOF EVONIK DEGUSSA GMBH (DE) 2014-03-13 US disclosed
EP-2615122-A1 RESIN COMPOSITION, AND SEMICONDUCTOR DEVICE PRODUCED USING RESIN COMPOSITION Sumitomo Bakelite Co., Ltd. (JP) 2013-07-17 EP disclosed
US-20130158188-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE PRODUCED USING RESIN COMPOSITION SUMITOMO BAKELITE CO., LTD. (JP) 2013-06-20 US disclosed
US-20130109798-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE PRODUCED BY USING THE SAME SUMITOMO BAKELITE CO., LTD. (JP) 2013-05-02 US disclosed
US-8298679-B2 Aqueous silane systems based on bis(trialkoxysilylalkyl)amines EVONIK DEGUSSA GMBH (DE) 2012-10-30 US disclosed
US-20120068106-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE PRODUCED BY USING THE SAME SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-03-22 US disclosed
US-20120031302-A1 AQUEOUS SILANE SYSTEMS BASED ON TRIS(ALKOXYSILYLALKYL)AMINES AND THE USE THEREOF EVONIK DEGUSSA GMBH (DE) 2012-02-09 US disclosed
US-8088308-B2 Resin composition and semiconductor device produced by using the same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2012-01-03 US disclosed
US-20110268899-A1 AQUEOUS SILANE SYSTEMS BASED ON BIS(TRIALKOXYSILYLALKYL)AMINES EVONIK DEGUSSA GMBH (DE) 2011-11-03 US disclosed
US-20070213467-A1 Resin Composition and Semiconductor Device Produced By Using the Same SUMITOMO BAKELITE COMPANY, LTD. (JP) 2007-09-13 US disclosed
EP-1736520-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICES MADE BY USING THE SAME Sumitomo Bakelite Company, Ltd. (JP) 2006-12-27 EP disclosed