SCHEMBL2090331

SCHEMBL2090331

CCCC(=CC1CCCCC1)C(=O)O

nearest known ligand 0.54

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.54
GRIK2 Q13002 1/20 0.51
EPHX1 P07099 9/20 0.36
KDM4E B2RXH2 1/20 0.36
ALDH1A1 P00352 1/20 0.36
NAAA Q02083 1/20 0.34
FFAR3 O14843 1/20 0.33
HDAC3 O15379 1/20 0.33
HDAC1 Q13547 1/20 0.33
HDAC2 Q92769 1/20 0.33
HDAC8 Q9BY41 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
PTGES O14684 1/20 0.33
ALOX5 P09917 1/20 0.33
EPHX2 P34913 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL322607 0.89 GRIK1 (0.51) GRIK1GRIK2EPHX1NAAAPTGES
SCHEMBL692340 0.89 GRIK1 (0.51) GRIK1GRIK2EPHX1NAAAPTGES
SCHEMBL2536866 0.88 GRIK1 (0.50) GRIK1GRIK2ALDH1A1NAAAPTGES
SCHEMBL1651116 0.85 GRIK1 (0.57) GRIK1GRIK2EPHX1KDM4EALDH1A1
SCHEMBL157326 0.85 GRIK1 (0.57) GRIK1GRIK2EPHX1KDM4EALDH1A1
SCHEMBL27279087 0.84 GRIK1 (0.45) GRIK1GRIK2EPHX1KDM4EALDH1A1
SCHEMBL3853225 0.83 GRIK1 (0.56) GRIK1GRIK2ALDH1A1
SCHEMBL990463 0.82 GRIK1 (0.56) GRIK1GRIK2ALDH1A1FFAR3SMN1; SMN2
SCHEMBL990464 0.82 GRIK1 (0.56) GRIK1GRIK2ALDH1A1FFAR3SMN1; SMN2
SCHEMBL12498813 0.82 GRIK1 (0.56) GRIK1GRIK2ALDH1A1FFAR3SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8163836-B2 low hygroscopicity, high alkali resistance, heat resistance of 200 degrees Celcius or higher, and can be easily removed with a stripping liquid; use with semiconductor processing; terpolymer of styrene, an alkyl (meth)acrylate, and a cycloaliphatic (meth)acrylate TOKYO OHKA KOGYO CO., LTD. (JP) 2012-04-24 US disclosed
US-7999052-B2 Process for producing an adhesive composition TOKYO OHKA KOGYO CO., LTD. (JP) 2011-08-16 US disclosed
US-20100227996-A1 ADHESIVE COMPOSITION, FILM ADHESIVE, AND PROCESS FOR PRODUCTION OF THE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2010-09-09 US disclosed
US-20100178497-A1 ADHESIVE COMPOSITION, FILM ADHESIVE, AND PROCESS FOR PRODUCTION OF THE COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2010-07-15 US disclosed
US-20090137760-A1 ADHESIVE COMPOSITION AND ADHESIVE FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2009-05-28 US disclosed