SCHEMBL990464

SCHEMBL990464

CCC(=CC1CCCC1)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
GRIK1 P39086 2/20 0.56
GRIK2 Q13002 1/20 0.56
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
MAPT P10636 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
FFAR3 O14843 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL990463 1.00 GRIK1 (0.56) GRIK1GRIK2ALDH1A1LMNAMAPT
SCHEMBL12498813 1.00 GRIK1 (0.56) GRIK1GRIK2ALDH1A1LMNAMAPT
SCHEMBL1651116 0.98 GRIK1 (0.57) GRIK1GRIK2ALDH1A1LMNAMAPT
SCHEMBL157326 0.98 GRIK1 (0.57) GRIK1GRIK2ALDH1A1LMNAMAPT
SCHEMBL15534303 0.91 GRIK1 (0.46) GRIK1GRIK2FFAR3
SCHEMBL15534301 0.91 GRIK1 (0.46) GRIK1GRIK2FFAR3
SCHEMBL9156635 0.82 GRIK1 (0.40) GRIK1GRIK2
SCHEMBL9156626 0.82 GRIK1 (0.40) GRIK1GRIK2
SCHEMBL2090331 0.82 GRIK1 (0.54) GRIK1GRIK2ALDH1A1SMN1; SMN2FFAR3
SCHEMBL692340 0.80 GRIK1 (0.51) GRIK1GRIK2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 90 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8557501-B2 Developable bottom antireflective coating compositions especially suitable for ion implant applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2013-10-15 US claimed
US-20120178029-A1 DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS ESPECIALLY SUITABLE FOR ION IMPLANT APPLICATIONS INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-07-12 US claimed
US-8182978-B2 Developable bottom antireflective coating compositions especially suitable for ion implant applications INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-05-22 US claimed
US-20090181171-A1 Method of Controlling Orientation of Domains in Block Copolymer Films INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2009-07-16 US claimed
EP-1766474-A2 PHOTOACTIVE COMPOUNDS AZ Electronic Materials USA Corp. (US) 2007-03-28 EP claimed
WO-2005121894-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. (DE) 2005-12-22 WO claimed
US-20050271974-A1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. 2005-12-08 US claimed
EP-2384457-B1 COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2022-07-06 EP disclosed
EP-3259292-B1 BLOCK COPOLYMERS WITH SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS AND PROCESSES THEREOF AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) 2020-04-08 EP disclosed
US-10259907-B2 Block copolymers with surface-active junction groups, compositions and processes thereof AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) 2019-04-16 US disclosed
EP-3259292-A1 BLOCK COPOLYMERS WITH SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS AND PROCESSES THEREOF AZ Electronic Materials Luxembourg S.à.r.l. (LU) 2017-12-27 EP disclosed
US-9765054-B2 Histone deacetylase inhibitors and compositions and methods of use thereof CHDI FOUNDATION, INC. (US) 2017-09-19 US disclosed
WO-2017144385-A1 BLOCK COPOLYMERS WITH LINEAR SURFACE-ACTIVE JUNCTION GROUPS, COMPOSITIONS AND PROCESSES THEREOF AZ Electronic Materials (Luxembourg) S.à.r.l. (LU) 2017-08-31 WO disclosed
WO-2007007175-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONIC MATERIAL USA CORP. (DE) 2007-01-18 WO disclosed
WO-2005121894-A2 PHOTOACTIVE COMPOUNDS AZ ELECTRONICS MATERIALS USA CORP. (DE) 2005-12-22 WO disclosed
US-20050271974-A1 Photoactive compounds AZ ELECTRONIC MATERIALS USA CORP. 2005-12-08 US disclosed
US-6908722-B2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORPORATION (JP) 2005-06-21 US disclosed
US-20030225216-A1 Water dispersed resin composition for flocking NATIONAL STARCH AND CHEMICAL INVESTMENT HOLDING CORPORATION 2003-12-04 US disclosed
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR CORPORATION (JP) 2003-06-19 US disclosed
EP-1270553-A2 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition JSR Corporation (JP) 2003-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030113658-A1 Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition ASIC1, PFAS, RARA GRIK1 660/4885GRIK2 941/4885ALDH1A1 1216/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.