⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21035225 | 0.87 | — | — | |
| SCHEMBL25620369 | 0.87 | — | — | |
| SCHEMBL23624597 | 0.84 | — | — | |
| SCHEMBL22893467 | 0.84 | — | — | |
| SCHEMBL18401298 | 0.78 | — | — | |
| SCHEMBL25162231 | 0.77 | — | — | |
| SCHEMBL19051596 | 0.76 | — | — | |
| SCHEMBL22375310 | 0.75 | — | — | |
| SCHEMBL15866284 | 0.75 | — | — | |
| SCHEMBL17578579 | 0.74 | TRPA1 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11586110-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-21 | — | — | US | disclosed |
| US-20220066319-A1 | POSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-03-03 | — | — | US | disclosed |
| US-11163232-B2 | Resist composition, patterning process, and barium salt | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-11-02 | — | — | US | disclosed |
| US-10948822-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-03-16 | — | — | US | disclosed |
| US-20210033971-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-02-04 | — | — | US | disclosed |
| US-20190113846-A1 | RESIST COMPOSITION, PATTERNING PROCESS, AND BARIUM SALT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-04-18 | — | — | US | disclosed |