SCHEMBL20915399

SCHEMBL20915399

CCCCc1c2ccccc2c(CCCC)c2c(Oc3c(Oc4ccccc4)ccc4c(CCCC)c5ccccc5c(CCCC)c34)c(Oc3ccccc3)ccc12

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LTA4H P09960 2/20 0.40
POLB P06746 1/20 0.39
ATM Q13315 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
KDM4E B2RXH2 2/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
TSHR P16473 1/20 0.38
HSD17B10 Q99714 1/20 0.38
NCEH1 Q6PIU2 1/20 0.36
MAPT P10636 2/20 0.35
LMNA P02545 1/20 0.35
ALDH1A1 P00352 2/20 0.33
GAA P10253 2/20 0.33
HTT P42858 1/20 0.33
KMT2A Q03164 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
HPGD P15428 1/20 0.33
BCL2L2 Q92843 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20915496 0.96 LTA4H (0.40) LTA4HPOLBATML3MBTL1KDM4E
SCHEMBL20915697 0.95 LTA4H (0.39) LTA4HPOLBATML3MBTL1
SCHEMBL20398445 0.95 LTA4H (0.39) LTA4HPOLBATML3MBTL1
SCHEMBL20398579 0.95 LTA4H (0.39) LTA4HPOLBATML3MBTL1
SCHEMBL20915355 0.95 LTA4H (0.39) LTA4HPOLBATML3MBTL1
SCHEMBL20915638 0.95 LTA4H (0.39) LTA4HPOLBATML3MBTL1
SCHEMBL20915392 0.92 KDM4E (0.41) LTA4HPOLBATML3MBTL1KDM4E
SCHEMBL20915636 0.87 MCL1 (0.34) LTA4HALDH1A1
SCHEMBL20915526 0.86 TTR (0.34) LTA4HKDM4ECYP1A2CYP3A4MAPT
SCHEMBL20915653 0.86 RHEB (0.38) LTA4HPOLBKDM4ELMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11149103-B2 Photopolymerization sensitizer composition and photopolymerizable composition comprising the same KAWASAKI KASEI CHEMICALS LTD. (JP) 2021-10-19 US disclosed
CN-108026197-B Photopolymerizable composition 川崎化成工业株式会社 2020-11-17 CN disclosed
US-20190119426-A1 PHOTOPOLYMERIZATION SENSITIZER COMPOSITION AND PHOTOPOLYMERIZABLE COMPOSITION COMPRISING THE SAME KAWASAKI KASEI CHEMICALS LTD. (JP) 2019-04-25 US disclosed