Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.53 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27352834 | 0.85 | CYP1A2 (0.67) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL20924697 | 0.81 | CYP2C19 (0.53) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL27352835 | 0.80 | CYP1A2 (0.64) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL11887994 | 0.79 | CYP1A2 (0.51) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL24688014 | 0.77 | CYP1A2 (0.60) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL9596654 | 0.76 | CA12 (0.46) | ALDH1A1KMT2ATSHRMEN1HSD17B10 | |
| SCHEMBL19667893 | 0.73 | ALDH1A1 (0.62) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL29783045 | 0.73 | ALDH1A1 (0.62) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL30855594 | 0.71 | CYP1A2 (0.57) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A | |
| SCHEMBL7346924 | 0.71 | CYP1A2 (0.57) | CYP1A2CYP3A4CYP2C19ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |