⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22733236 | 1.00 | — | — | |
| SCHEMBL445380 | 0.84 | — | — | |
| SCHEMBL91317 | 0.81 | — | — | |
| SCHEMBL14749069 | 0.81 | — | — | |
| SCHEMBL21237436 | 0.80 | — | — | |
| SCHEMBL26017287 | 0.79 | — | — | |
| SCHEMBL524812 | 0.77 | — | — | |
| SCHEMBL13202656 | 0.76 | — | — | |
| SCHEMBL13202652 | 0.76 | MEN1 (0.31) | — | |
| SCHEMBL23462627 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2781959-B1 | Radiation-sensitive resin composition, method for forming resist pattern, polymer and polymerizable compound | JSR CORP (JP) | 2019-04-24 | — | — | EP | disclosed |