Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 10/20 | 0.48 |
| ▸ | ESR2 | Q92731 | 6/20 | 0.48 |
| ▸ | BACE1 | P56817 | 1/20 | 0.36 |
| ▸ | AR | P10275 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.35 |
| ▸ | ESRRG | P62508 | 1/20 | 0.34 |
| ▸ | HSD17B1 | P14061 | 2/20 | 0.33 |
| ▸ | CA5A | P35218 | 1/20 | 0.33 |
| ▸ | VDR | P11473 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18643615 | 0.90 | ESR1 (0.55) | ESR1ESR2BACE1ARGAA | |
| SCHEMBL21167288 | 0.90 | ESR1 (0.55) | ESR1ESR2BACE1ARGAA | |
| SCHEMBL19884613 | 0.85 | ESR1 (0.38) | ESR1ESR2ARALDH1A1ESRRG | |
| SCHEMBL12526572 | 0.82 | ESR1 (0.52) | ESR1ESR2ARALDH1A1ESRRG | |
| SCHEMBL19884626 | 0.81 | ESR1 (0.59) | ESR1ESR2BACE1ARALDH1A1 | |
| SCHEMBL19842187 | 0.79 | ESR1 (0.52) | ESR1ESR2ARALDH1A1ESRRG | |
| SCHEMBL5031065 | 0.78 | ESR1 (0.75) | ESR1ESR2BACE1ARALDH1A1 | |
| SCHEMBL20925211 | 0.77 | ESR1 (0.65) | ESR1ESR2ARALDH1A1ESRRG | |
| SCHEMBL18643616 | 0.75 | ESR1 (0.49) | ESR1ESR2ARALDH1A1ESRRG | |
| SCHEMBL9298912 | 0.74 | ESR1 (0.74) | ESR1ESR2ARGAAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2505576-B1 | CYCLIC COMPOUND, PROCESS FOR PRODUCTION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL CO (JP) | 2019-04-24 | — | — | EP | disclosed |