Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 14/20 | 0.75 |
| ▸ | ESR2 | Q92731 | 9/20 | 0.75 |
| ▸ | AR | P10275 | 4/20 | 0.53 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TYR | P14679 | 1/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.48 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.48 |
| ▸ | HTR6 | P50406 | 1/20 | 0.48 |
| ▸ | ESRRG | P62508 | 1/20 | 0.48 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | BACE1 | P56817 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12005784 | 0.94 | ESR1 (0.68) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL20198395 | 0.94 | ESR1 (0.68) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL12004569 | 0.94 | ESR1 (0.68) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL3646850 | 0.94 | ESR1 (0.68) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL6523088 | 0.93 | ESR1 (0.71) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL22271942 | 0.93 | ESR1 (0.71) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL29471727 | 0.91 | ESR1 (0.80) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL29465776 | 0.91 | ESR1 (0.80) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL217305 | 0.91 | ESR1 (0.80) | ESR1ESR2ARHPGDHSD17B10 | |
| SCHEMBL3645152 | 0.89 | ESR1 (0.62) | ESR1ESR2ARESRRGMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160200877-A1 | SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20160200877-A1 | SILICONE SKELETON-CONTAINING POLYMER COMPOUND, CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, PATTERNING PROCESS, LAYERED PRODUCT, SUBSTRATE, AND SEMICONDUCTOR APPARATUS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-07-14 | — | — | US | disclosed |
| US-7615331-B2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-7615331-B2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM CORPORATION (JP) | 2009-11-10 | — | — | US | disclosed |
| US-20080234426-A1 | Curable Composition and Cured Object Thereof | KANEKA CORPORATION (JP) | 2008-09-25 | — | — | US | disclosed |
| US-20080081294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080081294-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD OF CURED RELIEF PATTERN USING THE SAME AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2008-04-03 | — | — | US | disclosed |
| EP-1906246-A2 | Photosensitive resin composition, production method of cured relief pattern using the same and semiconductor device | FUJIFILM Corporation (JP) | 2008-04-02 | — | — | EP | disclosed |
| EP-1852472-A1 | CURABLE COMPOSITION AND CURED OBJECT THEREOF | Kaneka Corporation (JP) | 2007-11-07 | — | — | EP | disclosed |
| US-7008883-B2 | Photoresist composition for forming an insulation film, insulation film for organic electroluminescence devices and process for producing the insulation film | ZEON CORPORATION (JP) | 2006-03-07 | — | — | US | disclosed |
| US-20040096771-A1 | Photoresist composition for forming an insulation film, insulation film for organic electroluminescence element and method for itis formation | ZEON CORPORATION (JP) | 2004-05-20 | — | — | US | disclosed |
| EP-1321821-A1 | PHOTORESIST COMPOSITION FOR FORMING INSULATION FILM, INSULATION FILM FOR ORGANIC ELECTROLUMINESCENCE ELEMENT AND METHOD FOR ITS FORMATION | NIPPON ZEON CO., LTD. (JP) | 2003-06-25 | — | — | EP | disclosed |
| US-6013407-A | PHOTORESISTS WITH PHENOLIC RESINS, QUINONEDIAZIDE SULFONATES, PHOTOSENSITIVE AGENTS AND PHENOLIC COMPOUNDS | NIPPON ZEON CO., LTD. (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0709358-B1 | NOVEL CLATHRATE COMPOUND, PROCESS FOR PRODUCING THE SAME, AND ANTIFOULING AGENT | NIPPON SODA CO (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0831370-A1 | POSITIVE RESIST COMPOSITION | NIPPON ZEON CO., LTD. (JP) | 1998-03-25 | — | — | EP | disclosed |
| EP-0816349-A1 | NOVEL CLATHRATE COMPOUND, PROCESS FOR PRODUCING THE SAME, AND COATING COMPOSITION CONTAINING SAID NOVEL CLATHRATE COMPOUND | ROHM AND HAAS COMPANY (US) | 1998-01-07 | — | — | EP | disclosed |
| EP-0709358-A1 | NOVEL CLATHRATE COMPOUND, PROCESS FOR PRODUCING THE SAME, AND ANTIFOULING AGENT | NIPPON SODA CO., LTD. (JP) | 1996-05-01 | — | — | EP | disclosed |